Refractive index control and etching of C–S–Au film by plasma processes

详细信息	查看全文 | 推荐本文 |

• 作者：Matushita ; Masaki ; Abul Kashem ; Md. ; Morita ; Shinzo
• 关键词：RF plasma CVD ; Sputtering ; C&ndash ; S&ndash ; Au film ; Refractive index ; Electronic polarizability ; O₂ plasma etching
• 刊名：Surface and Coatings Technology
• 出版年：2003
• 期刊代码：106_02578972
• 类别：ms
• 出版时间：June 2, 2003
• 卷：169-170
• 期：Complete
• 页码：639-642
• 文件大小：86.8 K

摘要

Carbon–sulfur–gold (C–S–Au) film and amorphous carbon film are considered to use for a photonic crystal as a high and low refractive index material. Practically two-dimensional photonic crystal is under fabrication for an optical wave-guide. These materials have advantages for the use because the materials were optically transparent in the visible wavelength range and the films have process compatibility for the O₂ plasma etching. The C–S–Au film was formed by co-operative process of plasma CVD and sputtering with using gold plate discharge electrode and optical properties were characterized.