Influence of substrate type on surface structure of polymeric perfluorocarbon in the initial stage of deposition in Ar/c-C₄F₈ plasmas

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• 作者：Kenji Furuya ; Ryoichi Nakanishi ; Hiroshi Okumura ; Makoto Makita ; Akira Harata
• 关键词：Fluorocarbon film ; Plasma polymerization ; C4F8 ; Low-k material ; Surface structure ; XPS ; AFM
• 刊名：Thin Solid Films
• 出版年：2008
• 期刊代码：78_00406090
• 类别：ph
• 出版时间：31 July 2008
• 卷：516
• 期：18
• 页码：6028-6032
• 文件大小：598 K

摘要

Polymeric perfluorocarbon was deposited on the Si, Ag and Al substrates in Ar/c-C₄F₈ plasmas under a deposition rate of 10 nm/h for seven hours. The X-ray photoelectron spectra and atomic force microscope images of the deposited materials were observed. As a result, it has been found that the surface structure and chemical bonding of the deposited materials are remarkably different from each other, depending on the kind of substrate.