In situ monitoring of electrical resistance of nanoferrite thin film irradiated by 190 MeV Au¹⁴⁺ ions

详细信息	查看全文 | 推荐本文 |

• 作者：Ghosh ; Sanjukta ; Ayyub ; P. ; Kumar ; N. ; Khan ; S.A. ; Banerjee ; D.
• 关键词：25.75.&minus ; q ; 61.82.Ms ; 29.17.+w ; 81.15.Cd ; Ferrite thin films ; Swift heavy ions ; Resistivity ; Oxygen loss measurement
• 刊名：Nuclear Instruments and Methods in Physics Research Section B ; Beam Interactions with Materials and Atoms
• 出版年：2003
• 期刊代码：42_0168583x
• 类别：ph
• 出版时间：December, 2003
• 卷：212
• 期：Complete
• 页码：510-515
• 文件大小：285 K

摘要

A highly resistive nanocrystalline thin film of Li_0.25Mg_0.5Mn_0.1Fe_2.15O₄, deposited by RF magnetron sputtering technique on Si(100) substrate, is irradiated with 190 MeV Au¹⁴⁺ ions. To probe the swift heavy ion induced modifications in the electrical properties in the film an in situ measurement of electrical resistance using two-probe method is carried out. We observe the value of resistivity comes down drastically from 1.5×10⁸ to 1×10⁵ Ωcm after irradiation at the fluence of 1×10¹³ ions/cm². In XRD spectra after irradiation no previous spinel peaks are observed. No loss in oxygen content with fluence is observed. We have presented the observed phenomenon as an effect of formation of amorphized latent tracks on the basis of thermal spike model.