Field emission enhancement of amorphous carbon films by nitrogen-implantation
- 作者：Li ; Junjie ; Zheng ; Weitao ; Gu ; Changzhi ; Jin ; Zengsun ; Zhao ; Yongnian ; Mei ; Xianxiu ; Mu ; Zongxi ; et. al.
- 关键词：A. Carbon films ; B. Implantation ; C. Raman spectroscopy ; X-ray photoelectron spectroscopy ; D. Field emission
- 刊名：Carbon
- 出版年：2004
- 期刊代码：10_00086223
- 类别：ms
- 出版时间：2004
- 卷：42
- 期：11
- 页码：2309-2314
- 文件大小：440 K
摘要
Effect of nitrogen-implantation on electron field emission properties of amorphous carbon films has been examined. Raman and X-ray photoelectron spectroscopy measurements reveal different types of C–N bonds formed upon nitrogen-implantation. The threshold field is lowered from 14 to 4 V/μm with increasing the dose of implantation from 0 to 5×1017 cm−2 and the corresponding effective work function is estimated to be in the range of 0.01–0.1 eV. From the perspective of tetrahedron bond formation, a mechanism for the nitrogen-lowered work function is proposed, suggesting that both the nitrogen nonbonding (lone pair) and the lone-pair-induced carbon antiboding (dipole) states are responsible for lowering the work function and hence the threshold field.