Structural, electrical and optical properties of thermochromic VO₂ thin films obtained by reactive electron beam evaporation

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• 作者：J. Leroy ; A. Bessaudou ; ^{annie.bessaudou@xlim.fr} ; F. Cosset ; A. Crunteanu
• 关键词：Physical vapor deposition ; Vanadium dioxide ; Thin films ; Metal&ndash ; insulator transition ; X-rays diffraction ; Electrical resistivity ; Optical transmission
• 刊名：Thin Solid Films
• 出版年：2012
• 期刊代码：78_00406090
• 类别：ph
• 出版时间：1 May, 2012
• 卷：520
• 期：14
• 页码：4823-4825
• 文件大小：533 K

摘要

We present the structural and physical characterization of vanadium dioxide (VO₂) thin films prepared by reactive electron beam evaporation from a vanadium target under oxygen atmosphere. We correlate the experimental parameters (substrate temperature, oxygen flow) with the films structural properties under a radiofrequency incident power fixed to 50 W. Most of the obtained layers exhibit monocrystalline structures matching that of the monoclinic VO₂ phase. The temperature dependence of the electrical resistivity and optical transmission for the obtained films show that they present thermoelectric and thermochromic properties, with a phase transition temperature around 68 掳C. The results show that for specific experimental conditions the VO₂ layers exhibit sharp changes in electrical and optical properties across the phase transition.