Investigation of the depth range through ultra-thin carbon films on magnetic layers by time-of-flight secondary ion mass spectrometry

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• 作者：Tadokoro ; N. ; Yuki ; M. ; Osakabe ; K.
• 关键词：TOF-SIMS ; XPS ; Magnetic disk ; Sampling depth ; Escape depth ; Incidence angle
• 刊名：Applied Surface Science
• 出版年：2003
• 期刊代码：6_01694332
• 类别：ms
• 出版时间：January 15, 2003
• 卷：203-204
• 期：Complete
• 页码：72-77
• 文件大小：188 K

摘要

This paper presents an examination of the depth range of magnetic layers through ultra-thin carbon films by time-of-flight secondary ion mass spectrometry (TOF-SIMS). X-ray photoelectron spectroscopy (XPS) was used for comparison of TOF-SIMS. The sampling depth of TOF-SIMS is somewhat smaller than that of XPS. And also, the sampling depth obtained from this analysis is larger than that of the static SIMS (less than 1nm) [Surf. Interf. Anal. 10 (1987) 384]. Our results suggest that the sampling depth is related to the sample structure (defects or pinholes of nanometer scale), the sensitivity of analytical tools and the emission process.