Pulsed electrodeposition of bismuth telluride films: Influence of pulse parameters over nucleation and morphology

详细信息	查看全文 | 推荐本文 |

• 作者：V. Richoux ; S. Diliberto ; C. Boulanger ; J.M. Lecuire
• 关键词：Bismuth telluride ; Electrodeposition ; Pulse plating ; Nucleation ; Morphology
• 刊名：Electrochimica Acta
• 出版年：2007
• 期刊代码：30_00134686
• 类别：ch
• 出版时间：15 February 2007
• 卷：52
• 期：9
• 页码：3053-3060
• 文件大小：1779 K

摘要

Pulsed electrodeposition methods were applied to the preparation of bismuth telluride films. Over the potential ranges from −170 mV to −600 mV, the formation of Bi₂Te₃ nuclei proceeded through a three-dimensional instantaneous nucleation mode. The nuclei densities for several values of potential were ranged between 10⁶ nuclei cm⁻² and 10⁸ nuclei cm⁻². For a pulsed galvanostatic electroplating, the best covering percentage and a stoichiometry close to the desired Bi₂Te₃ were obtained with the parameters t_on, t_off and J_c, respectively, equal to 10 ms, 1000 ms and −100 mA cm⁻².