Growth of Lab>2b>Tib>2b>Ob>7b> and LaTiOb>3b> thin films using pulsed laser deposition

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• 作者：S. Havelia ; K.R. Balasubramaniam ; S. Spurgeon ; F. Cormack ; P.A. Salvador
• 关键词：A1. X-ray diffraction ; A3. Pulsed laser deposition ; B1. (1 1 0)-Layered perovskite ; B1. Rare-earth compounds ; B2. Ferroelectric materials
• 刊名：Journal of Crystal Growth
• 出版年：2008
• 期刊代码：49_00220248
• 类别：ch
• 出版时间：April 2008
• 卷：310
• 期：7-9
• 页码：1985-1990
• 文件大小：233 K

摘要

The influence of substrate temperature, oxygen activity of the ambient gas, and substrate type on the growth morphology, phase selection, and epitaxy of thin films in the LaTiOb>xb> (x≈3.0 or 3.5) family were investigated. The films were deposited using pulsed laser deposition (PLD) from a Lab>2b>Tib>2b>Ob>7b> target and were characterized using X-ray diffraction. In oxygen atmospheres, coupled with high deposition temperatures and use of (1 1 0)-oriented SrTiOb>3b> substrates, the growth of epitaxial films of (1 1 0)-layered perovskite Lab>2b>Tib>2b>Ob>7b> is observed. However, under similar deposition conditions, on SrTiOb>3b>(1 0 0) substrates, no crystalline peaks were observed even at the higher temperatures. The reduction of Ti⁴⁺ to Ti³⁺ was achieved by the use of nitrogen atmospheres. This resulted in the formation of the cubic perovskite LaTiOb>3b>, on SrTiOb>3b>(1 1 0), SrTiOb>3b>(1 0 0), and LaAlOb>3b>(1 0 0) substrates.