Growth and structural characterization of epitaxial Bab>0.6b>Srb>0.4b>TiOb>3b> films deposited on REScOb>3b>(1 1 0) (RE=Dy, Gd) substrates using pulsed laser depo
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摘要
Bab>0.6b>Srb>0.4b>TiOb>3b> films were deposited by pulsed laser deposition on orthorhombic REScOb>3b>(1 1 0) (RE=Dy, Gd) single-crystal substrates. Films were investigated for their growth mode, crystalline quality, and strain states. Substrates were treated prior to growth to produce atomically flat surfaces having wide terraces (≈200 nm) and clear unit-cell-high steps. Atomic force microscopy and reflection high-energy electron diffraction indicated that the films grew epitaxially in a two-dimensional (2D) layer-by-layer mode. X-ray diffraction showed that all films (200 nm thick and less) were coherently/orthorhombically strained to the substrate according to the epitaxial relationship: (0 0 1)b>filmb>short parallelborder="0">(1 1 0)b>substrateb>; [1 0 0]b>filmb>short parallelborder="0">[0 0 1]b>substrateb> (and [0 1 0]b>filmb>short parallelborder="0">[1 1¯ 0]b>substrateb>). (0 0 2) rocking curves were 17 and 20 arcsec wide for films grown on RE=Dy and Gd, respectively.These films have rocking curve widths and dislocation densities that are several orders of magnitude lower than a film grown on SrTiOb>3b> (0 0 1).

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