Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography
- 作者：Marko Vogler ; Sabine Wiedenberg ; Michael Mü ; hlberger ; Iris Bergmair ; Thomas Glinsner ; Holger Schmidt ; Ernst-Bernhard Kley ; Gabi Grü ; tzner
- 关键词：UV-nanoimprint lithography ; Resist ; UV curing ; Spin-coating
- 刊名：Microelectronic Engineering
- 出版年：2007
- 期刊代码：91_01679317
- 类别：cp
- 出版时间：May-August 2007
- 卷：84
- 期：5-8
- 页码：984-988
- 文件大小：472 K
摘要
There are two basic types of nanoimprint lithography: hot embossing using thermoplastic or thermosetting polymers and UV-based nanoimprint lithography (UV-NIL) using UV-curable polymer systems. Since the interest in UV-NIL has been constantly increasing within the last years, the need of suitable low-viscosity resists has increased, too. The availability of such materials is one key element of the UV-NIL technology. In this contribution a novel, spin-coatable polymer system for UV-NIL is presented. Suitable polymer components were evaluated using photoDSC analysis. Their ratio was adjusted in such a way that the overall dynamic viscosity of the mixture remained low which was beneficial for the flow behaviour. Film thicknesses in the range of 150–500 nm could be obtained by spin-coating. The new polymer system was characterised in UV-NIL processes and in plasma etching investigations. Imprinted micrometer as well as nanometer scale patterns with feature sizes in the range of 30 nm to several microns are shown.