Dry friction behaviour of SiCx(H) (1,5<x<3) coatings obtained by microwave PACVD
摘要
Thin coatings in the Si-C system were obtained in a plasma device actived by microwave. Their chemical composition and mechanical properties are dependent on the deposition parameters like temperature and gas flow rate in the reactor. When the substrate temperature increases the stationnary dry friction coefficient is lower than 0.1 and the wear scar is smooth. In this case surface analyses reveal an interfacial layer on the antagonist which participates to the good tribological behaviour. With a hydrogen flow in the reactor, the coating flaked. The microstructure, the mechanical properties and the tribological behaviour are closely interdependent.