Diamond films grown without seeding treatment and bias by hot-filament CVD system

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• 作者：M. Ali^a ; ^{mubarak74@comsats.edu.pk} ; M. Ü ; rgen^b ; ^{urgen@itu.edu.tr}
• 关键词：Thin films ; Hot-filament CVD ; Surface treatment ; Crystal structure
• 刊名：Solid State Sciences
• 出版年：2012
• 期刊代码：98_12932558
• 类别：ch
• 出版时间：April, 2012
• 卷：14
• 期：4
• 页码：540-544
• 文件大小：805 K

摘要

Diamond film growth without seeding treatment has been the subject of numerous studies. In the present study, diamond films with/without seeding treatment were grown on silicon using hot-filament chemical vapour deposition. An inexpensive and simple approach, namely, 鈥渄ry ultrasonic treatment鈥? was introduced in which full coverage of diamond film was achieved on unseeded substrate. For comparison, one substrate was seeded with 5 渭m diamond particles, prior to deposition. The resulting diamond films were examined through standard characterization tools and distinct features were observed in each film. Here we present the results of uniform and high purity diamond film, free from nano-sized grains, which is grown without seeding treatment and is expected to be potential candidate for electro-optical applications, particularly as heat sinks.