Effect of deposition conditions on thermo-mechanical properties of free standing silicon-rich silicon nitride thin film

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• 作者：Yun Hwangbo^a ; Jung-Min Park^b ; Walter L. Brown^c ; Jun-Hwan Goo^a ; Hak-Joo Lee^a ; Seungmin Hyun^a ; ^{hyun@kimm.re.kr}
• 关键词：Silicon-rich silicon nitride ; Bulge test ; Resonant test ; Elastic modulus ; Residual stress ; Thermal expansion coefficient
• 刊名：Microelectronic Engineering
• 出版年：2012
• 期刊代码：91_01679317
• 类别：cp
• 出版时间：July, 2012
• 卷：95
• 期：Complete
• 页码：34-41
• 文件大小：1031 K

摘要

Using resonance and bulge techniques, the mechanical properties of free standing Si-rich SiN_x membranes were precisely measured to evaluate the effect of deposition conditions on them over a narrow range of particular technological interest. Values of the elastic modulus, the residual stress and the thermal expansion coefficient were obtained. It was found that even small differences in gas composition in low pressure CVD deposition make substantial changes in residual stress and significant but much smaller changes in the elastic modulus.