On the optical constants of amorphous GexSe1−x thin films of non-uniform thickness prepared by plasma-enhanced chemical vapour deposition
摘要
The preparation of layers of amorphous GexSe1−x (with Ge atomic concentrations x=0, 0.17, 0.25 and 0.34) by plasma-enhanced chemical vapour deposition (PECVD) using the hydrides, GeH4 and H2Se, as precursor gases is described in detail. Information concerning the structure of the films was obtained from Raman spectroscopy. The optical transmission was measured over the 300 to 2500 nm spectral region in order to derive the refractive index and extinction coefficient of these PECVD films. The expressions proposed by Swanepoel, enabling the calculation of the optical constants of a thin film with non-uniform thickness, have successfully been applied. The refractive-index dispersion data were analysed using the Wemple–DiDomenico single-oscillator fit. The optical-absorption edges have been all of them described using the ‘non-direct transition' model proposed by Tauc. The optical gaps were calculated using Tauc's extrapolation, resulting in values ranging from 1.93 eV for a-Se to 2.26 eV for a-GeSe2.