Deposition of nanostructured photocatalytic zinc ferrite films using solution precursor plasma spraying

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• 作者：Rekha Dom ; G. Sivakumar ; Neha Y. Hebalkar ; Shrikant V. Joshi ; Pramod H. Borse ; ^{phborse@arci.res.in} ; ^{pborse@yahoo.com}
• 关键词：A. Electronic Materials ; A. Nanostructures ; B. Plasma Deposition
• 刊名：Materials Research Bulletin
• 出版年：2012
• 期刊代码：60_00255408
• 类别：ms
• 出版时间：March, 2012
• 卷：47
• 期：3
• 页码：562-570
• 文件大小：1954 K

摘要

Deposition of pure spinel phase, photocatalytic zinc ferrite films on SS-304 substrates by solution precursor plasma spraying (SPPS) has been demonstrated for the first time. Deposition parameters such as precursor solution pH, concentration, film thickness, plasma power and gun-substrate distance were found to control physico-chemical properties of the film, with respect to their crystallinity, phase purity, and morphology. Alkaline precursor conditions (7 < pH 鈮?#xA0;10) were found to favor oxide film formation. The nanostructured films produced under optimized conditions, with 500 mM solution at pH 鈭?#xA0;8.0, yielded pure cubic phase ZnFe₂O₄ film. Very high/low precursor concentrations yielded mixed phase, less adherent, and highly inhomogeneous thin films. Desired spinel phase was achieved in as-deposited condition under appropriately controlled spray conditions and exhibited a band gap of 鈭?.9 eV. The highly porous nature of the films favored its photocatalytic performance as indicated by methylene blue de-coloration under solar radiation. These immobilized films display good potential for visible light photocatalytic applications.