Determining factor of MoSe<sub>2sub> formation in Cu(In,Ga)Se<sub>2sub> solar Cells
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摘要
The MoSe<sub>2sub> layers, as a necessary interface layer in Cu(In,Ga)Se<sub>2sub>/Mo for high-efficiency Cu(In,Ga)Se<sub>2sub> solar cells, were observed to form in the Mo and CIGS/Mo films during the selenization process. In order to reveal the determining factor of MoSe<sub>2sub>, the correlation of MoSe<sub>2sub> thickness with the Mo sputtering pressure was investigated. The MoSe<sub>2sub> thickness increased with decreasing the sputtering pressure. Furthermore, the dependence of MoSe<sub>2sub> thickness on the deposition time of SiO<sub>2sub> layer and the characterizations of X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy demonstrate that the formation of Na<sub>2sub>Se<sub>xsub> compounds plays a determining role for the formation of MoSe<sub>2sub> layer. The illuminated I-V characterization showed that the high series resistance of the CIGS solar cell was induced by too thick MoSe<sub>2sub> layer. The significant deterioration of efficiency was observed because of the peeling-off of the absorber layer from Mo layer when the MoSe<sub>2sub> layer was too thin.

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