Effects of incorporation of Si or Hf on the microstructure and mechanical properties of Ti–Al–N films prepared by arc ion plating (AIP)

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• 作者：Changjie Feng ; Shenglong Zhu ; Mingsheng Li ; Li Xin ; Fuhui Wang
• 关键词：Ti&#x2013 ; Al&#x2013 ; Si&#x2013 ; N ; Ti&#x2013 ; Al&#x2013 ; Hf&#x2013 ; N ; Arc ion plating ; Microstructure ; Mechanical properties
• 刊名：Surface and Coatings Technology
• 出版年：2008
• 期刊代码：106_02578972
• 类别：ms
• 出版时间：15 April 2008
• 卷：202
• 期：14
• 页码：3257-3262
• 文件大小：1559 K

摘要

Ti–Al–N, Ti–Al–Si–N and Ti–Al–Hf–N films were deposited on 1Cr11Ni2W2MoV stainless steel by arc ion plating (AIP) with a Ti₇₀Al₃₀, a Ti₆₀Al₃₀Si₁₀ and a Ti₆₈Al₃₀Hf₂ cathode, respectively. The effects of Si or Hf addition on the composition, microstructure and mechanical properties of the Ti–Al–N films were investigated by EPMA, TEM, SEM, XRD, micro-hardness and wear tests. The results show that all the deposited films possessed B1 structure. With the incorporation of Si or Hf, the texture of Ti–Al–N films remarkably changed from preferred orientation of (220) to mixture broadened orientations of (111), (200) and (220), the mean crystallite size of Ti–Al–N decreased from ~ 90 nm to ~ 30 and ~ 15 nm and no peaks of crystalline Si₃N₄ were detected from XRD analyses. Due to the addition of Si or Hf, the micro-hardness of Ti–Al–N films increased remarkably from 23.5 Gpa to 33.6 or 29.5 GPa, and the wear resistance was also enhanced. The effects of incorporation of Si or Hf on the microstructure and mechanical properties of Ti–Al–N films are discussed.