Natively textured surface aluminum-doped zinc oxide transparent conductive layers for thin film solar cells via pulsed direct-current reactive magnetron sputtering
- 作者：Xin-liang Chen ; cxlruzhou@163.com ; Lin-na Li ; Fei Wang ; Jian Ni ; Xin-hua Geng ; Xiao-dan Zhang ; Ying Zhao
- 关键词：Zinc oxide ; Thin films ; Transparent conductive oxides ; Magnetron sputtering ; Textured surface ; Solar cells
- 刊名：Thin Solid Films
- 出版年：2012
- 期刊代码：78_00406090
- 类别：ph
- 出版时间：1 June, 2012
- 卷：520
- 期：16
- 页码：5392-5399
- 文件大小：1266 K
摘要
Natively textured surface aluminum-doped zinc oxide (ZnO:Al) layers for thin film solar cells were directly deposited without any surface treatments via pulsed direct-current reactive magnetron sputtering on glass substrates. Such an in-situ texturing method for sputtered ZnO:Al thin films has the advantages of efficiently reducing production costs and dramatically saving time in photovoltaic industrial processing. High purity metallic Zn-Al (purity: 99.999%, Al 2.0 wt.%) target and oxygen (purity: 99.999%) were used as source materials. During the reactive sputtering process, the oxygen gas flow rate was controlled using plasma emission monitoring. The performance of the textured surface ZnO:Al transparent conductive oxides (TCOs) thin films can be modified by changing the number of deposition rounds (i.e. thin-film thicknesses). The initially milky ZnO:Al TCO thin films deposited at a substrate temperature of ~ 553 K exhibit rough crater-like surface morphology with high transparencies (T ~ 80-85%in visible range) and excellent electrical properties (蟻 ~ 3.4 脳 10鈭?#xA0;4 惟 cm). Finally, the textured-surface ZnO:Al TCO thin films were preliminarily applied in pin-type silicon thin film solar cells.