Preparation and properties of TiN and AlN films from alkoxide solution by thermal plasma CVD method
- 作者：Shimada ; Shiro ; Yoshimatsu ; Motoki ; Nagai ; Hideaki ; Suzuki ; Masaaki ; Komaki ; Hisashi
- 关键词：Titanium nitride ; Aluminum nitride ; Alkoxide solution ; Plasma processing and deposition
- 刊名：Thin Solid Films
- 出版年：2000
- 期刊代码：78_00406090
- 类别：ph
- 出版时间：July 17, 2000
- 卷：370
- 期：1-2
- 页码：137-145
- 文件大小：650 K
摘要
Single phase TiN and AlN films were prepared on a Si wafer from titanium tetra-etoxide and aluminum tri-butoxide solutions dissolved in ethanol and toluene, respectively, using an Ar/N2/H2 radio-frequency (r.f.) inductive thermal plasma chemical vapor deposition (CVD) method. The films were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, measurement of electrical resistivity and Vickers microhardness. Factors affecting the formation of the films (lattice parameter, chemical composition, oxygen/carbon content, and deposition rate of the films) were examined in terms of the N2 flow rate (2.5–4.5 slm), substrate temperature (300–700°C), feed rate of the solution (0.025–0.3 ml/min), and the mole ratio of the alkoxide solution (1:1–1:3). The optimum conditions for preparation of TiN films produced a film 0.2–3 μm thick with an oxygen content of 8 at.%and a free carbon content of 4 at.%, showing an electrical resistivity of 370 μΩ cm. The optimum conditions for AlN films produced a film 0.3 μm thick containing 14 at.%oxygen and 8 wt.%carbon. The deposition rate of the TiN film was determined to be 30–35 nm/min. The Vickers microhardness of the TiN and AlN films was found to be 10±1 and 13±3 GPa, respectively.