Research on Frictional Behavior of Tungsten Disulfide Thin Films Prepared by Rf Magnetron Sputtering on Restless Steel

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• 作者：G.Y. Du^a ; D.C. Ba^a ; ^{gydu@mail.neu.edu.cn} ; Z. Tan^b ; K. Liu^a
• 关键词：tungsten disulfide ; RF sputter ; sputter technology ; chemical constitution ; friction coefficient
• 刊名：Physics Procedia
• 出版年：2012
• 期刊代码：P128_18753892
• 类别：ph
• 出版时间：2012
• 卷：32
• 期：Complete
• 页码：532-538
• 文件大小：1021 K

摘要

The method of preparation tungsten disulfide thin film with RF sputtering on 3Cr13 martensitic stain less steel was researched in this paper. Different power, pressure and deposition time had been taken to prepare samples. Then the samples were tested by XRD, SEM to analyzing phase, surface topography and chemical constitution. Binding force and frictional wear coefficient of tungsten disulfide thin film was also tested. The results showed that non-crystalline tungsten disulfide thin film could be prepared by RF sputter, films鈥?S/W ratio were usually less-than 2,and were impacted by sputter technological parameter obviously, when the deposition power strengthen S/W ratio was lower, when the deposition time lengthen S/W ratio was higher. The binding force of the film was impacted by sputter technological parameter obscurely. The coefficient of friction of the sample prepared by RF sputter had inverselyproportional relationship with S/W ratio in definitive range.