Low temperature preparation of transparent, antireflective TiO₂ films deposited at different O₂/Ar ratios by microwave electron cyclotron resonance magnetron sputtering

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• 作者：Wen Du^a ; ^b ; Yinping Ye^a ; Hongxuan Li^a ; Fei Zhao^a ; ^b ; Li Ji^a ; Weilong Quan^a ; ^b ; Jianmin Chen^a ; ^{chenjm@lzb.ac.cn} ; Huidi Zhou^a
• 关键词：Titanium oxide thin film ; MW-ECR ; O2/Ar ratio ; Antireflection
• 刊名：Vacuum
• 出版年：2012
• 期刊代码：83_0042207x
• 类别：ph
• 出版时间：14 March, 2012
• 卷：86
• 期：9
• 页码：1387-1392
• 文件大小：976 K

摘要

A serial of crystalline titanium oxide ceramic films were deposited at low temperature using microwave electron cyclotron resonance (MW-ECR) magnetron sputtering with different O₂/Ar ratios. The influences of O₂/Ar ratio on the deposition rate, morphology, crystalline nature, optical adsorption property of the obtained titanium oxide thin films were investigated by means of X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-Vis spectra. Therefore, the optimum O₂/Ar ratio for deposition of anatase TiO₂ thin films on unheated glass substrate was realized in a MW-ECR magnetron sputtering process. The as-deposited anatase TiO₂ films were transparent and were antireflective in the visible region.