Ion implantation induced by Cu ablation at high laser fluence
- 作者：L. Torrisi ; A.M. Mezzasalma ; S. Gammino ; J. Badziak ; P. Parys ; J. Wolowski ; L. Laska and G. Franco
- 关键词：Laser ablation ; Plasma laser ; Ion implantation ; RBS analysis ; AES analysis
- 刊名：Applied Surface Science
- 出版年：2006
- 期刊代码：6_01694332
- 类别：ms
- 出版时间：15 October 2006
- 卷：252
- 期：24
- 页码：8533-8538
- 文件大小：499 K
摘要
High energy laser plasma-produced Cu ions have been implanted in silicon substrates placed at different distances and angles with respect to the normal to the surface of the ablated target. The implanted samples have been produced using the iodine high power Prague Asterix Laser System (PALS) using 438 nm wavelength irradiating in vacuum a Cu target. The high laser pulse energy (up to 230 J) and the short pulse duration (400 ps) produced a non-equilibrium plasma expanding mainly along the normal to the Cu target surface. Time-of-flight (TOF) technique was employed, through an electrostatic ion energy analyzer (IEA) placed along the target normal, in order to measure the ion energy, the ion charge state, the energy distribution and the charge state distribution. Ions had a Boltzmann energy distributions with an energy increasing with the charge state. At a laser fluence of the order of 6 × 106 J/cm2, the maximum ion energy was about 600 keV and the maximum charge state was about 27+.
In order to investigate the implantation processes, Cu depth profiles have been performed with Rutherford backscattering spectrometry (RBS) of 1.5 MeV helium ions, Auger electron spectroscopy (AES) with 3 keV electron beam and 1 keV Ar sputtering ions in combination with scanning electron microscopy (SEM). Surface analysis results indicate that Cu ions are implanted within the first surface layers and that the ion penetration ranges are in agreement with the ion energy measured with IEA analysis.