Removal of H₂S from gas stream using combined plasma photolysis technique at atmospheric pressure

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• 作者：Li Huang ; ^{lihuang.env@gmail.com} ; Lanyan Xia ; Xiaoxue Ge ; Hengye Jing ; Wenbo Dong ; Huiqi Hou
• 关键词：Combination of dielectric barrier discharge plasma with photolysis ; VUV ; Hydrogen sulfide ; Kr&ndash ; I2 excimer
• 刊名：Chemosphere
• 出版年：2012
• 期刊代码：15_00456535
• 类别：env
• 出版时间：June, 2012
• 卷：88
• 期：2
• 页码：229-234
• 文件大小：313 K

摘要

In this paper, H₂S in gas stream was successfully decomposed at atmospheric pressure by dielectric barrier discharge plasma and VUV-UV radiation from a combined plasma photolysis reactor (CDBD). In comparison with DBD, CDBD enhanced H₂S removal efficiency significantly at the same applied voltage, inlet H₂S concentration and gas residence time. H₂S removal efficiency was determined as a function of Kr pressure, applied voltage, inlet H₂S concentration, and gas residence time. H₂S removal efficiency could reach as high as 93%at inlet H₂S concentration of 27.1 mg m^鈭?, residence time of 0.4 s, and applied voltage of 7.5 kV. The main products were discerned as H₂O and based on FTIR and IC analysis.