Femtosecond laser-induced damage in reflector

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• 作者：Haiyi Sun ; Tianqing Jia ; Xiaoxi Li ; Chengbin Li ; Donghai Feng ; Shizhen Xu ; Xiaochun Ge and Zhizhan Xu
• 关键词：45° ; high-reflection mirror ; Femtosecond laser ; Damage threshold ; Ablation depth
• 刊名：Applied Surface Science
• 出版年：2006
• 期刊代码：6_01694332
• 类别：ms
• 出版时间：15 May 2006
• 卷：252
• 期：14
• 页码：5109-5115
• 文件大小：344 K

摘要

We have investigated the damage for ZrO₂/SiO₂ 800 nm 45° high-reflection mirror with femtosecond pulses. The damage morphologies and the evolution of ablation crater depths with laser fluences are dramatically different from that with pulse longer than a few tens of picoseconds. The ablation in multilayers occurs layer by layer, and not continuously as in the case of bulk single crystalline or amorphous materials. The weak point in damage is the interface between two layers. We also report its single-short damage thresholds for pulse durations ranging from 50 to 900 fs, which departs from the diffusion-dominated scaling. A developed avalanche model, including the production of conduction band electrons (CBE) and laser energy deposition, is applied to study the damage mechanisms. The theoretical results agree well with our measurements.