Preparation and characterization of La_0.9Sr_0.1Ga_0.8Mg_0.2O_{3鈭?span style='font-style: italic'>未} thin film electrolyte deposited by RF magnetron sputtering on the porous anode support for IT-SOFC

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• 作者：Hongyan Sun^a ; ^b ; ^d ; Wenhui Ma^a ; ^b ; ^{mwhsilicon@163.com} ; Jie Yu^a ; ^b ; Xiuhua Chen^c ; Wei Sen^a ; Yang Zhou^a ; ^b
• 关键词：Solid oxide fuel cell ; RF magnetron sputtering ; LSGM ; Thin film
• 刊名：Vacuum
• 出版年：2012
• 期刊代码：83_0042207x
• 类别：ph
• 出版时间：29 February, 2012
• 卷：86
• 期：8
• 页码：1203-1209
• 文件大小：1448 K

摘要

Thin films of solid electrolyte La_0.9Sr_0.1Ga_0.8Mg_0.2O_3鈭?em>未 (LSGM) were deposited by RF magnetron sputtering onto porous La_0.7Sr_0.3Cr_0.5Mn_0.5O_3鈭?em>未 (LSCM) anode substrates. The effects of substrate temperature, sputtering power density and sputtering Ar gas pressure on the LSGM thin film density, flatness and morphology were systematically investigated. RF sputtering power density of 7.8 W cm^鈭?, substrate temperature of 300 掳C and sputtering Ar gas pressure of 5 Pa are identified as the best technical parameters. In addition, a three-electrode half cell configuration was selected to investigate the electrochemical performance of the thin film. The LSGM film deposited at optimum conditions exhibited a lower area specific ohmic resistance of 0.68 惟 cm^鈭? at 800 掳C, showing that the practicability of RF magnetron sputtering method to fabricate LSGM electrolyte thin film on porous LSCM anode substrates.