Effect of annealing on thermal stability and morphology of pulsed laser deposited Ir thin films

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• 作者：Yansheng Gong ; Chuanbin Wang ; Qiang Shen ; Lianmeng Zhang
• 关键词：Iridium thin films ; Annealing ; Stability ; Morphology ; Pulsed laser deposition
• 刊名：Applied Surface Science
• 出版年：2008
• 期刊代码：6_01694332
• 类别：ms
• 出版时间：30 April 2008
• 卷：254
• 期：13
• 页码：3921-3924
• 文件大小：591 K

摘要

Iridium (Ir) thin films, deposited on Si (1 0 0) substrate by pulsed laser deposition (PLD) technique using Ir target in a vacuum atmosphere, were annealed in air ambient and the thermal stability was investigated. The crystal structure and surface morphology of Ir thin films before and after being annealed were studied by X-ray diffraction, Raman scattering, scanning electron microscope, and atomic force microscopy. The results showed that single-phase Ir thin films with (1 1 1) preferred orientation could be deposited on Si (1 0 0) substrate at 300 °C and it remained stable below 600 °C, which showed a promising bottom electrode of integrated ferroelectric capacitors. Ir thin films got oxidized to IrO₂ at temperatures from 650 to 800 °C.