Controlled reduction of size of Ag nanoparticles embedded in teflon matrix by MeV ion irradiation

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• 作者：Y.K. Mishra ; V.S.K. Chakravadhanula ; U. Schü ; rmann ; Hardeep Kumar ; D. Kabiraj ; S. Ghosh ; V. Zaporojtchenko ; D.K. Avasthi ; F. Faupel
• 关键词：Ag-Teflon nanocomposites ; Surface plasmon resonance ; Ion beams
• 刊名：Nuclear Instruments and Methods in Physics Research Section B ; Beam Interactions with Materials and Atoms
• 出版年：2008
• 期刊代码：42_0168583x
• 类别：ph
• 出版时间：April 2008
• 卷：266
• 期：8
• 页码：1804-1809
• 文件大小：601 K

摘要

MeV ion irradiation of Ag-Teflon nanocomposite (NC) films, which were synthesized by co-sputtering, was studied in this work. Irradiation of these NC thin films with 100 MeV Ag⁸⁺ ions at fluences from 3 × 10¹¹ to 1 × 10¹² ions/cm² resulted in the reduction of size of Ag NPs as evident by the increase in width of plasmon absorption band and red shift in plasmon absorption peak. TEM results confirmed the decrease in size of NPs by the changes evident from the particle size distribution, which emphasize the role of ion beams in nano-engineering. This article reports the possibility of reduction in size and size distribution in controlled fashion by swift heavy ion irradiation.