Etching rate and structural modification of polymer films during low energy ion irradiation

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• 作者：Zaporojtchenko ; V. ; Zekonyte ; J. ; Erichsen ; J. ; Faupel ; F.
• 关键词：61.80.J ; 61.82.P ; 64.70 ; 79.60 ; Ion irradiation effects ; Polymers ; Glass transition ; X-ray photoelectron spectra &ndash ; surface analysis
• 刊名：Nuclear Instruments and Methods in Physics Research Section B ; Beam Interactions with Materials and Atoms
• 出版年：2003
• 期刊代码：42_0168583x
• 类别：ph
• 出版时间：August, 2003
• 卷：208
• 期：Complete
• 页码：155-160
• 文件大小：110 K

摘要

Various polymers were sputtered with low energy Ar⁺ ions of 1 keV in order to determine their etching rate. Hydrocarbons, oxygenated, fluorinated and nitrogen-containing glassy polymers with a broad range of the glass transition temperature (T_g) were chosen. The etching rate was measured using a profilometer, and X-ray photoelectron spectroscopy. At the same time the surface chemical modification, and the surface glass transition temperature were studied. Comparing the sputter rate to the various polymer properties a correlation among the T_g, cross-link density, and sputter rate was found. In addition, the sputter rate as a function of the integral ion fluence proved to exhibit a sharp increase in the initial regime of very low fluence. The results are discussed in terms of the characteristics of the polymers.