Transparent p-type conducting K-doped NiO films deposited by pulsed plasma deposition

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• 作者：Ming Yang ; Haifeng Pu ; Qianfei Zhou ; Qun Zhang ; ^{zhangqun@fudan.edu.cn}
• 关键词：Transparent conducting oxide ; Potassium ; Doping ; Nickel oxide ; TCO ; K-doped NiO ; Pulsed plasma deposition
• 刊名：Thin Solid Films
• 出版年：2012
• 期刊代码：78_00406090
• 类别：ph
• 出版时间：1 July, 2012
• 卷：520
• 期：18
• 页码：5884-5888
• 文件大小：915 K

摘要

Transparent p-type conducting K-doped NiO thin films were prepared by pulsed plasma deposition. The structural, electrical and optical properties of the films were investigated using X-ray diffraction, atomic force microscope, X-ray photoelectron spectroscopy, Hall measurement, and ultraviolet-visible spectroscopy, respectively. The dependency of film properties on K doping content and substrate temperature was studied. The film with K doping content of 25 at.%deposited at room temperature exhibits the highest conductivity of 4.25 S cm^鈭?#xA0;1 and an average transmittance of nearly 60%in visible light region.