Chemical Vapor Deposition and Atomic Layer Deposition of Coatings for Mechanical Applications
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- 作者：G. L. Doll (1) gary.doll@timken.com
B. A. Mensah (2)
H. Mohseni (2)
T. W. Scharf (2) scharf@unt.edu - 关键词：atomic layer deposition ; chemical vapor deposition ; protective coatings ; tribology
- 刊名：Journal of Thermal Spray Technology
- 出版时间：January 2010
- 出版年：2010
- 期刊代码：26_1544-1016
- 类别：ch
- 卷：19
- 期：1-2
- 页码：510-516
- 数据来源：sp
摘要
Chemical vapor deposition (CVD) of films and coatings involves the chemical reaction of gases on or near a substrate surface. This deposition method can produce coatings with tightly controlled dimensions and novel structures. Furthermore, the non-line-of-sight-deposition capability of CVD facilitates the coating of complex-shaped mechanical components. Atomic layer deposition (ALD) is also a chemical gas phase thin film deposition technique, but unlike CVD, it utilizes “self-limiting” surface adsorption reactions (chemisorption) to control the thickness of deposited films. This article provides an overview of CVD and ALD, discusses some of their fundamental and practical aspects, and examines their advantages and limitations versus other vapor processing techniques such as physical vapor deposition in regard to coatings for mechanical applications. Finally, site-specific cross-sectional transmission electron microscopy inside the wear track of an ALD ZnO/ZrO2 8 bilayers nanolaminate coating determined the mechanisms that control the friction and wear.