Atomic layer deposition of the titanium dioxide thin film from tetraethoxytitanium and water
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- 作者：A. P. Alekhin ; G. I. Lapushkin ; A. M. Markeev ; A. A. Sigarev and V. F. Toknova
- 刊名：Russian Journal of General Chemistry
- 出版时间：June 2010
- 出版年：2010
- 期刊代码：32_10703632
- 类别：ph
- 卷：80
- 期：6
- 页码：1091-1096
- 数据来源：sp
摘要
Using the methods of Rutherford backscattering spectrometry, X-ray photoelectron spectroscopy, X-ray diffraction in the geometry of the grazing beam, and Fourier transform infrared spectroscopy, we studied the chemical composition and structure of thin films of titanium dioxide formed by atomic layer deposition from tetraethoxytitanium and water. It is shown that the films obtained are characterized by a high stoichiometry of composition and by amorphous or polycrystalline structure of the anatase modification, depending on the number of reaction cycles. Using a model of the process of atomic layer deposition that takes into account the size and number of ligands of the reacting molecules, we calculated the amount of titanium dioxide deposited in a single reaction cycle.