Nanometer Diamonds Development and Application for Polishing Glass Substrates
- 作者：Alex LeeA.H.TanJung-Li
- 会议时间：2013-11-13
- 关键词：nanometer diamond ; polish ; glass substrate ; hard disk
- 母体文献：第六届郑州国际超硬材料及制品研讨会暨庆祝中国人造金刚石诞生50周年大会论文集
- 会议名称：第六届郑州国际超硬材料及制品研讨会暨庆祝中国人造金刚石诞生50周年大会
- 会议地点：郑州
- 主办单位：中国机床工具工业协会
- 语种：chi
摘要
Magnetic storage hard disk drives (HDDs) have been used widely to provide storage of digital information in modern computer systems and consumer electronic products.Hard disk substrates play a key role in the data storage process of HDDs.However, a potential failure mode exists to the head burnish induced clearance requirements by variation induced by substrate nanoasperities.Developing a polish process to eliminate surface asperities and residual surface defects on the glass substrate is therefore a necessity to meet the challenges of future technology.Three distinct diamonds of A, B and C were utilized in this study.The major difference among these three distinct cluster diamond types is the diamond percentage.The differing diamond percentage content in turn induced a different structure and changed the polish properties.HRTEM, XPS,Raman, BET, AFM, Optical Surface Analyzer and disk defect tester were used for the diamond particles, polished substrate and disk analysis.Based on analysis results, the percentage of crystalline diamond in A, B and C solutions is 90%, 80% and 70%, respectively.A, B and C diamond particles exhibited an average primary crystalline size of 8, 6 and 6 nm.The C graphite/diamond ratio is 4.45 which is higher than that of B (3.29) and A (2.88).The C slurry generates relatively smaller Ra as compared to A and B.This is due to the lower diamond percentage with smaller particle density and higher particle surface area in C.Its lower polish penetration depth causes a smoother polish surface, which in turn reduces surface scratches thus improving the disk quality.On the other hand, all of the three slurries show similar polish stock removal amounts.