辉光渗钽层的制备与烧蚀性能
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摘要
为了研究渗钽层对合金表面烧蚀性能的影响,利用双层辉光等离子渗金属的方法,在34CrNi3Mo钢表面制备了渗钽层,研究了渗钽层的表面形貌、相结构、元素分布、硬度以及渗层与基体结合力的变化情况,并对其烧蚀性能和耐蚀性能进行试验研究.结果表明:渗钽层主要由体心立方α相钽组成,沉积层深度约为10μm,扩散层深度约5μm;渗钽层表面硬度约500HV_(0.2),与基体的结合力约65N;在相同的工况下,渗钽层的耐烧蚀性能优于基体,并能够阻止C、N与基体形成脆化层;随着脉冲烧蚀次数增加,烧蚀面积增大,但烧蚀深度均较浅;在高功率脉冲烧蚀工况下,渗钽层可以减轻金属的熔融和气化,从而提高了基体的耐烧蚀性能.
In order to study the effect of Ta layer on the corrosion resistance of the alloy surface,the diffused layer was prepared on the 34 CrNi3 Mo steel surface by double glow plasma infiltration.The surface morphology,phase structure,element distribution,hardness change and the adhesion between the infiltrated layer and the substrate were investigated.The ablation property and corrosion resistance of Ta layer were analyzed.The results show that Ta layer is mainly composed of BCCα-Ta composition with the deposition layer depth of about 10μm and diffusion layer depth of about 3μm.The surface layer hardness is about 500 HV_(0.2) and the bonding strength is about 65 N.Under the same working condition,the corrosion resistance of Ta layer is better than that of matrix,which can prevent the formation of the embrittlement between C/N and matrix.With the increasing numbers of pulse ablation,the ablation area increases but the ablation depth maintains shallow.In the case of the high power pulse ablation,the Ta layer can decrease the melting and vaporization process,and improve the ablation resistance of the matrix.
In order to study the effect of Ta layer on the corrosion resistance of the alloy surface,the diffused layer was prepared on the 34 CrNi3 Mo steel surface by double glow plasma infiltration.The surface morphology,phase structure,element distribution,hardness change and the adhesion between the infiltrated layer and the substrate were investigated.The ablation property and corrosion resistance of Ta layer were analyzed.The results show that Ta layer is mainly composed of BCCα-Ta composition with the deposition layer depth of about 10μm and diffusion layer depth of about 3μm.The surface layer hardness is about 500 HV_(0.2) and the bonding strength is about 65 N.Under the same working condition,the corrosion resistance of Ta layer is better than that of matrix,which can prevent the formation of the embrittlement between C/N and matrix.With the increasing numbers of pulse ablation,the ablation area increases but the ablation depth maintains shallow.In the case of the high power pulse ablation,the Ta layer can decrease the melting and vaporization process,and improve the ablation resistance of the matrix.
引文
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[2]韩杰才,胡平,张幸红,等.超高温材料的研究进展[J].固体火箭技术,2005,28(4):289-294.HAN Jiecai,HU Ping,ZHANG Xinghong,et al.Advances on ultra-high temperature materials[J].Journal of Solid Rocket Technology,2005,28(4):289-294.
[3]杨秀丽,王晓辉,向仕彪,等.盐酸法富集钨渣中的钽和铌[J].中国有色金属学报,2013,23(3):873-881.YANG Xiuli,WANG Xiaohui,XIANG Shibiao,et al.Enrichment of tantalum and niobium from tungsten residue by hydrochloric acid method[J].The Chinese Journal of Nonferrous Metals,2013,23(3):873-881.
[4]陈朝轶,鲁雄刚,李重和,等.三相界面反应机制在SOM法制备金属钽中的应用[J].中国有色金属学报,2009,19(3):583-588.CHEN Chaoyi,LU Xionggang,LI Chonghe,et al.Application of three-phase interline reaction mechanism on preparation of Ta metal using SOM process[J].The Chinese Journal of Nonferrous Metals,2009,19(3):583-588.
[5]王升,熊党生,李建亮.熔盐电镀钽及其耐磨损烧蚀性能[J].中国表面工程,2015,28(2):101-107.WANG Sheng,XIONG Dangsheng,LI Jianliang.Wear and erosion resistance properties of electroplating Ta coating in molten salt[J].China Surface Engineering,2015,28(2):101-107.
[6]MASSOT L,CHAMELOT P,PALAU P,et al.Electrocrystallisation of tantalum in molten fluoride media[J].Electrochimica Acta,2005,50(27):5408-5413.
[7]NIKRAVES H M,AKBARI G H,POLADI A.A comprehensive study on the surface tribology of Ta thin film using molecular dynamics simulation:The effect of TaN interlayer,power and temperature[J].Tribology International,2017,105:185-192.
[8]HALLMANNA L,ULMER P.Effect of sputtering parameters and substrate composition on the structure of tantalum thin films[J].Applied Surface Science,2013,282:1-6.
[9]MATSON D W,MCCLANAHAN E D,RICE J P,et al.Effect of sputtering parameters on Ta coatings for gun bore applications[J].Surface and Coatings Technology,2000,133:411-416.
[10]陈飞,周海,潘俊德.钛合金表面辉光等离子渗钽的研究[J].材料热处理学报,2009,30(4):156-159.CHEN Fei,ZHOU Hai,PAN Junde.Study on double-glow discharge plasma tantalizing on titanium alloy surface[J].Transactions of Materials and Heat Treatment,2009,30(4):156-159.
[11]窦瑞芬,田林海,潘俊德,等.网状阴极法在碳钢表面沉积钽薄膜[J].中国有色金属学报,2001,11(S2):203-206.DOU Ruifen,TIAN Linhai,PAN Junde,et al.Ta film synthesized in carbon steel substrate by netshape cathode sputtering method[J].The Chinese Journal of Nonferrous Metals,2001,11(S2):203-206.
[12]GERLICH L,OHSIEK S,KLEIN C,et al.Interface engineering for the TaN/Ta barrier film deposition process to control Ta-crystal growth[J].Microelectronic Engineering,2013,106:63-68.
[13]PHAM V H,LEE S H,LI Y,et al.Utility of tantalum(Ta)coating to improve surface hardness in vitro bioactivity and biocompatibility of Co-Cr[J].Thin Solid Films,2013,536:269-274.
[14]CHANG B,ALLEN C,BLACKBURN J,et al.Fluid flow characteristics and porosity behavior in full penetration laser welding of a titanium alloy[J].Metallurgical and Materials Transactions B,2015,46(2):906-918.
[15]PARK K W,NA S J.Theoretical investigations on multiple-reflection and Rayleigh absorption emission scattering effects in laser drilling[J].Applied Surface Science,2010,256(8):2392-2399.