磁控溅射快速沉积钽涂层的组织及性能
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摘要
探索提高磁控溅射钽涂层沉积速率的方法,研究了沉积工艺如靶与基材相对关系、靶基间距、基体温度、沉积电流等参数对钽涂层的沉积速率、组织和性能的影响。结果表明靶基间距降低到20 mm,二者正对时沉积速率最高,达20μm/h,能制备出20μm厚钽涂层;基材温度为室温时,获得a相和β相组成的双相结构,提高基材温度到200℃时,可获得α相(脆性小)为主的单相组织;磁控溅射沉积的厚钽涂层内产生压应力,最大达621 MPa,厚钽涂层具有较高的显微硬度,为不锈钢基体的4倍。
We explored the way to improve the deposition rate of Ta coatings prepared by magnetron sputtering,for obtaining thick Ta coatings. The effect of process parameters,such as relation of target and substrate, target-to-substrate distance, substrate temperature, electric current on deposition rate,microstructure,and properties of Ta coatings were investigated. The experimental results show that the maximal deposition rate reaches 20 μm/h when the target and substrate are face to face and the target-tosubstrate distance reduces to 20 mm. Thick Ta coatings can be prepared by magnetron sputtering. The αand β double phase microstructure is obtained when the substrate temperature is at ambient,and the low brittleness α phase is obtained at elevated temperature. The stress of deposited Ta coatings is compressive,and the maximal value is about 621 MPa of thick Ta coatings. The microhardness of Ta coatings is very high,and is four times larger than that of stainless steels substrate.
We explored the way to improve the deposition rate of Ta coatings prepared by magnetron sputtering,for obtaining thick Ta coatings. The effect of process parameters,such as relation of target and substrate, target-to-substrate distance, substrate temperature, electric current on deposition rate,microstructure,and properties of Ta coatings were investigated. The experimental results show that the maximal deposition rate reaches 20 μm/h when the target and substrate are face to face and the target-tosubstrate distance reduces to 20 mm. Thick Ta coatings can be prepared by magnetron sputtering. The αand β double phase microstructure is obtained when the substrate temperature is at ambient,and the low brittleness α phase is obtained at elevated temperature. The stress of deposited Ta coatings is compressive,and the maximal value is about 621 MPa of thick Ta coatings. The microhardness of Ta coatings is very high,and is four times larger than that of stainless steels substrate.
引文
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[19]孙渊,张栋,午丽娟,等.材料残余应力对硬度测试影响程度分析[J].华东理工大学学报(自然科学版),2012,38(5):652-656.
[2] BALLA V K,BANERJEE S,BOSE S,et al. Direct laser processing of a tantalum coating on titanium for bone replacement structures[J]. Acta Biomater,2010,6:2329-2334.
[3] MATSON D W,MCCLANAHAN E D,RICE J P,et al.Effect of sputtering parameters on Ta coatings for gun bore applications[J]. Surf Coat Tech,2000,133-134:411
[4] MARROCCO T. Corrosion behavior of cold sprayed tantalum coatings[R]. TWI Ltd,Cambridge,2012.
[5] MAENG S,AXE L,TYSON T A,et al. Corrosion behavior of magnetron sputteredα-andβ-Ta coatings on AISI 4340steel as a function of coating thickness[J]. Corrosion Sci,2006,48:2154-2171.
[6] CHENG Y,CAI W,LI H T,et al. Surface characteristics and corrosion resistance properties of Ti Ni shape memory alloy coated with Ta[J]. Surf Coat Tech,2004,186:346-352.
[7] MAENG S,AXE L,TYSON T A,et al. Corrosion behaviour of electrodeposited and sputtered Cr coatings and sputtered Ta coatings withαandβphases[J]. Surf Coat Tech,2006,200:5767-5777.
[8] HEE C,JAMALI S S,BENDAVID A,et al. Corrosion behaviour and adhesion properties of sputtered tantalum coating on Ti6Al4V substrate[J]. Surf Coat Tech,2016:307:666-675.
[9] KINOS T,CHEN S L,SIITONEN P,et al. Densification of plasma-sprayed titanium and tantalum coatings[J]. J Therm Spray Technol,1996,5(4):439-444.
[10]蒋驰,周晋林,张鹏程,等.等离子喷涂参数对钽涂层组织及性能的影响[J].材料保护,2002,35(8):27-31.
[11] DITTRICK S,BALLA V K,BOSE S,et al. Wear performance of laser processed tantalum coatings[J]. Mater Sci Eng C,2011,31:1832-1835-1835.
[12] LEE Y J,KIM D Y,NERSISYAN H H,et al. Microstructural and corrosion characteristics of tantalum coatings prepared by molten salt electrodeposition[J]. Surf Coat Tech,2013,235:819-826.
[13]卢燕平,张长鑫,赵海滨,等.钢表面化学气相沉积担涂层的研究[J].北京钢铁学报,1984(2):118-123.
[14]蔡宏中,魏巧灵,魏燕,等. CVD温度对钽沉积层性能的影响[J].稀有金属材料与工程,2012,41(11):2037-2040.
[15] ZEIN EL A S,WELZ BIERMANN U,ENDRES F. A study on the electrodeposition of tantalum on Ni Ti alloy in an ionic and corrosion behavior of the coated alloy[J]. Electrochem Commun,2005,7:941-946.
[16] KOIVULUOTO H,BOLELLI G,LUSVARGHI L,et al. Corrosion resistance of cold-sprayed Ta coatings in very aggressive conditions[J]. Surf Coat Tech,2010,205:1103-1107.
[17]崔江涛,刘向力,田修波,等.直流磁控溅射沉积钽膜的结构与性能研究[J].真空科学与技术学报,2007,27(3):259-425.
[18]单玉桥,于晓中,李力,等.磁控溅射镀钽及其镀层性能的研究[J].电镀与涂饰,2005,24(6):423-425.
[19]孙渊,张栋,午丽娟,等.材料残余应力对硬度测试影响程度分析[J].华东理工大学学报(自然科学版),2012,38(5):652-656.