一种带有注入增强缓冲层的4H-SiC GTO晶闸管
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  • 英文篇名:A 4H-SiC GTO Thyristor with Injection Enhanced Buffer Layer
  • 作者:高吴昊 ; 陈万军 ; 刘超 ; 陶宏 ; 夏云 ; 谯彬 ; 施宜军 ; 邓小川 ; 李肇基 ; 张波
  • 英文作者:Gao Wuhao;Chen Wanjun;Liu Chao;Tao Hong;Xia Yun;Qiao Bin;Shi Yijun;Deng Xiaochuan;Li Zhaoji;Zhang Bo;School of Electronic Science and Engineering, University of Electronic Science and Technology of China;
  • 关键词:4H-SiC ; 门极可关断(GTO)晶闸管 ; 注入效率 ; 缓冲层 ; 脉冲功率
  • 英文关键词:4H-SiC;;gate turn-off(GTO) thyristor;;injection efficiency;;buffer layer;;pulse power
  • 中文刊名:BDTJ
  • 英文刊名:Semiconductor Technology
  • 机构:电子科技大学电子科学与工程学院;
  • 出版日期:2019-04-03
  • 出版单位:半导体技术
  • 年:2019
  • 期:v.44;No.368
  • 语种:中文;
  • 页:BDTJ201904006
  • 页数:6
  • CN:04
  • ISSN:13-1109/TN
  • 分类号:44-48+80
摘要
门极可关断(GTO)晶闸管是应用在脉冲功率领域中的一种重要的功率器件。目前,由于常规SiC GTO晶闸管的阴极注入效率较低,限制了器件性能的提高。提出了一种带有注入增强缓冲层的碳化硅门极可关断(IEB-GTO)晶闸管结构,相比于常规GTO晶闸管结构,该结构有着更高的阴极注入效率,从而减小了器件的导通电阻和功耗。仿真结果表明,当导通电流为1 000 A/cm~2时,IEB-GTO晶闸管的比导通电阻比常规GTO晶闸管下降了约45.5%;在脉冲峰值电流为6 000 A、半周期为1 ms的宽脉冲放电过程中,器件的最大导通压降比常规GTO晶闸管降低了约58.5%。
        Gate turn-off(GTO) thyristor is an important power device applied in pulse power area. At present, due to the low cathode injection efficiency of conventional SiC gate turn-off(SiC GTO) thyristor, the improvement of device performance is limited. A 4 H-SiC GTO thyristor with injection enhanced buffer layer(IEB-GTO) was proposed. Compared with the conventional GTO(CON-GTO) thyristor structure, the proposed one had higher cathode injection efficiency, thus the on-resistance and power consumption of the device were decreased. The simulation results show that the specific on-resistance of the IEB-GTO thyristor is reduced by 45.5% approximately compared with the CON-GTO thyristor when the conduction current is 1 000 A/cm~2. And the maximum conduction voltage drop is reduced by 58.5% approximately compared with the CON-GTO thyristor in the process of wide-pulse discharge with peak current of 6 000 A and half sinusoidal of 1 ms.
引文
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