二氧化钒薄膜的制备和应用研究新进展
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摘要
VO2在68℃左右时发生半导体—金属态的固-固相变,且相变前后光学和电学性能发生突变,该特性使VO2薄膜在红外智能窗、电致光开关器件、激光防护材料、自适应隐身材料等领域受到广泛研究。制备VO2薄膜的方法包括磁控溅射法、脉冲激光沉积法、溶胶-凝胶法、金属热蒸发法等,理想的制备参数是当前研究的重点。本文总结了近年来VO2在制备方法和应用发展上的研究现状,对进一步深入研究VO2薄膜的各项性能及应用具有借鉴意义。
VO2will change from semiconductor to metal phase,which is a solid to solid phase- transition,when its temperature is about 68 ℃,and its optical and electrical properties will mutate after the phase- transition. This feature makes the VO2 thin films to be widely studied in fields of infrared smart window,optical switch devices,laser protective materials,adaptive stealth materials,etc. Preparation methods of VO2 thin films include magnetron sputtering,pulsed laser deposition,sol- gel,metal thermal evaporation method,etc. The ideal preparation parameters are the focus of current research. Preparation methods and application status of VO2 thin film are summarized,which gives reference for further studies in the properties and applications of VO2 thin film.
VO2will change from semiconductor to metal phase,which is a solid to solid phase- transition,when its temperature is about 68 ℃,and its optical and electrical properties will mutate after the phase- transition. This feature makes the VO2 thin films to be widely studied in fields of infrared smart window,optical switch devices,laser protective materials,adaptive stealth materials,etc. Preparation methods of VO2 thin films include magnetron sputtering,pulsed laser deposition,sol- gel,metal thermal evaporation method,etc. The ideal preparation parameters are the focus of current research. Preparation methods and application status of VO2 thin film are summarized,which gives reference for further studies in the properties and applications of VO2 thin film.
引文
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