ZnS薄膜在532nm波长激光辐照下的光谱透射及激光损伤特性
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摘要
为探究ZnS薄膜的激光辐照效应,采用热蒸发沉积技术制备了ZnS薄膜,探究了薄膜在532nm波长激光诱导辐照下,不同能量阶和不同脉冲数对薄膜折射率、消光系数、损伤形貌、表面粗糙度和激光损伤阈值的影响。研究结果表明:ZnS薄膜的平均损伤阈值为1.59J·cm-2,用平均阈值能量的60%对薄膜进行辐照处理后,可将ZnS薄膜在532nm处的折射率从2.360 4提高到2.384 9 (15脉冲辐照)。用5脉冲辐照薄膜表面后,薄膜的消光系数会随着激光能量的增加而减小。532nm激光辐照下,ZnS薄膜经历了从轻度损伤到极度损伤的缓慢演变阶段。在5脉冲的基础上,增加激光的辐照能量会使薄膜的表面粗糙度Ra下降,最大可由1.52nm下降到0.429nm。
The study aims to examine the effect of laser irradiation on ZnS film.ZnS film was prepared by the thermal vapor deposition technique.With the film irradiated by 532 nm laser,the effects of different energy levels and different numbers of pulses on its refractive index,extinction coefficient,damage morphology,surface roughness and laser damage threshold were investigated.The results show that the average damage threshold of the ZnS film is 1.59 J·cm-2.After the film is irradiated with 60%of the average threshold energy,the refractive index of the ZnS film at 532 nm can be increased from2.360 4 to 2.384 9(15 pulses irradiation).After the film surface is irradiated with 5 pulses,its extinction coefficient decreases with the increase of laser energy.Irradiated by 532 nm laser,ZnS film has experienced a slow evolution from mild damage to extreme damage.On the basis of 5 pulses,increasing laser's irradiation energy reduces the surface roughness Ra,from 1.52 to 0.429 nm.
The study aims to examine the effect of laser irradiation on ZnS film.ZnS film was prepared by the thermal vapor deposition technique.With the film irradiated by 532 nm laser,the effects of different energy levels and different numbers of pulses on its refractive index,extinction coefficient,damage morphology,surface roughness and laser damage threshold were investigated.The results show that the average damage threshold of the ZnS film is 1.59 J·cm-2.After the film is irradiated with 60%of the average threshold energy,the refractive index of the ZnS film at 532 nm can be increased from2.360 4 to 2.384 9(15 pulses irradiation).After the film surface is irradiated with 5 pulses,its extinction coefficient decreases with the increase of laser energy.Irradiated by 532 nm laser,ZnS film has experienced a slow evolution from mild damage to extreme damage.On the basis of 5 pulses,increasing laser's irradiation energy reduces the surface roughness Ra,from 1.52 to 0.429 nm.
引文
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[2]QIU K F,QIU D P,CAI L,et al.Preparation of ZnSThin Films and ZnS/p-Si Heterojunction Solar Cells[J].Materials Letters,2017,198:23.
[3]ZHEN X M,DING C,LI B,et al.Properties Study of ZnS Thin Films Fabricated at Different Substrate Temperatures by Pulsed Laser Deposition[J].Advanced Materials Research,2013(821/822):835.
[4]叶自煜,王多书,张佰森,等.宽截止长波红外带通滤光片的研制[J].真空科学与技术学报,2009,29(Z1):39.YE Ziyu,WANG Duoshu,ZHANG Baisen,et al.Development of Infrared Pass-Band Filters with Wide Rejection Band[J].Chinese Journal of Vacuum Science and Technology,2009,29(Z1):39.(in Chinese)
[5]李海兵,徐勇军,蔡其文,等.太阳能高反射薄膜制备技术对薄膜性能的影响[J].中国表面工程,2016,29(3):34.LI Haibing,XU Yongjun,CAI Qiwen,et al.Influences of Preparation Technologies on Properties of Solar High Reflection Thin Films[J].China Surface Engineering,2016,29(3):34.(in Chinese)
[6]SUKEE A,KANTARAK E,SINGJAI P.Preparation of Aluminum Doped Zinc Oxide Thin Films on Glass Substrate by Sparking Process and Their Optical and Electrical Properties[C]//Siam Physics Congress2017.Mérida:Journal of Physics(Conference Series),2017:012153.
[7]YOSHIDA Y,YATSU S,WATANABE S,et al.Transformation in Iron-Platinum Thin Film Via Nanosecond Pulsed Laser Irradiation[J].Journal of Physics and Chemistry of Solids,2017,109:46.
[8]甘贵贤,陆慧.柔性PET衬底上ZnO薄膜的制备、电学性质及激光辐照效应[J].华东理工大学学报(自然科学版),2016,42(5):737.GAN Guixian,LU Hui.Electrical Properties of ZnOThin Films Deposited on Flexible PET Substrate and Effects of Laser Irradiation[J].Journal of East China University of Science and Technology(Natural Science Edition),2016,42(5):737.(in Chinese)
[9]LI X,LIU X F,ZHAO Y A,et al.Laser-conditioning Mechanism of ZrO2/SiO2 HR Films with Fitting Damage Probability Curves of Laser-induced Damage[J].Chinese Optics Letters,2010,8(6):598.
[10]任乃飞,祖伟,李保家,等.Ti/FTO复合薄膜的激光辐照处理及其光电性能研究[J].中国激光,2017,44(5):105.REN Naifei,ZU Wei,LI Baojia,et al.Research on Laser Irradiation Treatment and Photoelectric Property of Ti/FTO Composite Films[J].Chinese Journal of Lasers,2017,44(5):105.(in Chinese)
[11]胡建平,马平,许乔.用1064nm激光增强HfO2/SiO2薄膜的抗激光损伤能力的实验研究[J].强激光与粒子束,2003,15(11):1053.HU Jianping,MA Ping,XU Qiao.Experimental Study on the Laser Damage Resistance of HfO2/SiO2 Film Enhanced by 1064nm Laser[J].High Power Laser and Particle Beams,2003,15(11):1053.(in Chinese)
[12]TSENG S F,HSIAO W T,CHIANG D,et al.Mechanical and Optoelectric Properties of Post-annealed Fluorine-Doped Tin Oxide Films by Ultraviolet Laser Irradiation[J].Applied Surface Science,2011,257(16):7204.
[13]ZHAO S Y,HUA Y Q,CHEN R F,et al.Structural and Electrical Studies on ZnO-Based Thin Films by Laser Irradiation[J].Journal of Nanotechnology,2016(3):1.
[14]赵艳,蒋毅坚.ZnO薄膜的激光辐照效应研究[J].物理学报,2010,59(4):2679.ZHAO Yan,JIANG Yijian.The Effect of Laser Irradiation on ZnO Thin Films[J].Acta Physica Sinica,2010,59(4):2679.(in Chinese)