高热导率氮化硅散热基板材料的研究进展
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  • 英文篇名:Research Progress on High Thermal Conductivity Silicon Nitride as Heat Dissipation Substrate
  • 作者:刘雄章 ; 郭冉 ; 李青达 ; 衣雪梅
  • 英文作者:LIU Xiongzhang;GUO Ran;LI Qingda;YI Xuemei;School of Mechanical and Electronic Engineering, Northwest A & F University;
  • 关键词:氮化硅 ; 热导率 ; 散热基板 ; 机械性能
  • 英文关键词:silicon nitride;;thermal conductivity;;heat dissipation substrate;;mechanical properties
  • 中文刊名:TCXB
  • 英文刊名:Journal of Ceramics
  • 机构:西北农林科技大学机械与电子工程学院;
  • 出版日期:2018-02-08 14:18
  • 出版单位:陶瓷学报
  • 年:2018
  • 期:v.39
  • 基金:陕西省引进人才专项基金(Z11021201);; 西北科技大学国际合作种子基金(A213021607)
  • 语种:中文;
  • 页:TCXB201801011
  • 页数:7
  • CN:01
  • ISSN:36-1205/TS
  • 分类号:14-20
摘要
针对越来越明显的大功率电子元器件的散热问题,主要综述了目前氮化硅陶瓷作为散热基板材料的研究进展。对影响氮化硅陶瓷热导率的因素、制备高热导率氮化硅陶瓷的方法、烧结助剂的选择、以及氮化硅陶瓷机械性能和介电性能等方面的最新研究进展作了详细论述,最后总结了高热导率氮化硅作为散热基板材料的发展趋势。
        In view of the heat dissipation of high-power electronic devices, the research progress of silicon nitride ceramics as a heat sink material is reviewed. Then the effect of the main factors on the thermal conductivity, the preparation method, the sintering additives during sintering process, and the mechanical and dielectric properties of silicon nitride ceramics are detailedly discussed. Finally, the future prospect of silicon nitride ceramics as heat dissipation substrate material is predicted.
引文
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