薄膜光学微金字塔结构阵列的制备研究
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摘要
为了解决薄膜光学微结构中等效折射率梯度分布的问题。本文研究了轮廓渐变的薄膜微金字塔结构阵列,分析了微金字塔结构的典型制备工艺,提出了一种单点金刚石车削,结合纳米压印与电感耦合等离子体刻蚀技术的制备方法。实验结果表明:单点金刚石飞切形成的金字塔结构单元的尺寸可以在1～10μm之间进行调控,切削5 min可以形成直径12.5 mm的微结构成型区域;纳米压印技术与电感耦合等离子体刻蚀方法的结合,实现了薄膜光学微金字塔结构阵列的制备。
The study is intended to discuss the equivalent refractive index gradient distribution in the thin film optical microstructures.Based on the study of thin-film optical micropyramid structures array with contour gradients and the analysis of the typical preparation process of the micropyramid structure,a preparation process of single point diamond turning is proposed,in combination with nanoimprint lithography and inductively coupled plasma etching.Experimental results show that the size of the pyramidal unit formed by single-point diamond fly cutting can be adjusted between 1 μm and 10 μm and that a microstructured molding area with a diameter of 12.5 mm can be formed in 5 min.The thin film optical micropyramid structures array is prepared by the method which combines nanoimprint lithography with inductively coupled plasma etching technology.
The study is intended to discuss the equivalent refractive index gradient distribution in the thin film optical microstructures.Based on the study of thin-film optical micropyramid structures array with contour gradients and the analysis of the typical preparation process of the micropyramid structure,a preparation process of single point diamond turning is proposed,in combination with nanoimprint lithography and inductively coupled plasma etching.Experimental results show that the size of the pyramidal unit formed by single-point diamond fly cutting can be adjusted between 1 μm and 10 μm and that a microstructured molding area with a diameter of 12.5 mm can be formed in 5 min.The thin film optical micropyramid structures array is prepared by the method which combines nanoimprint lithography with inductively coupled plasma etching technology.
引文
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[16] AMALATHAS A P,ALKAISI M M.Efficient Light Trapping Nanopyramid Structures for Solar Cells Patterned Using UV Nanoimprint Lithography[J].Materials Science in Semiconductor Processing,2017,57:54.
[17] GE S B,LIU W G,ZHOU S,et al.Design and Preparation of a Micro-Pyramid Structured Thin Film for Broadband Infrared Antireflection[J].Coatings,2018,8(5):192.
[18] 周顺.电阻阵列红外景物产生器微桥结构的材料及制作研究[D].西安:西安电子科技大学,2011.ZHOU Shun.Research on Material and Fabrication of Microbridge Resistor Arrays for Infrared Scene Projectors[D].Xi’an:Xidian University,2011.(in Chinese)
[19] WU H,ODOM T W,CHIU D T,et al.Fabrication of Complex Three-dimensional Microchannel Systems in PDMS[J].Journal of the American Chemical Society,2003,125(2):554.
[20] VILLANUEVA L G,VAZQUEZ M O,OLMOS M C,et al.Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography[J].Micromachines,2013,4(4):370.
[21] NAGATO K.Injection Compression Molding of Replica Molds for Nanoimprint Lithography[J].Polymers,2014,6(3):604.
[2] PIESTUN R,SHAMIR J.Control of Wave-front Propagation with Diffractive Elements[J].Optics letters,1994,19(11):771.
[3] GRUNWALD R,KEBBEL V,NEUMANN U J,et al.Ultrafast Spatiotemporal Processing with Thin-film Micro-Optics[J].Optical Engineering,2004,43(11):2518.
[4] HWANG B,LEE J S.A Strategy to Design High-Density Nanoscale Devices Utilizing Vapor Deposition of Metal Halide Perovskite Materials[J].Advanced Materials,2017,29(29):1701048
[5] RANA S,RAKIN A S,HASAN M R,et al.Low Loss and Flat Dispersion Kagome Photonic Crystal Fiber in the Terahertz Regime[J].Optics Communications,2018,410:452.
[6] CHENG J,JIA H,WU Q,et al.Optical Filter Based on Metallic Glass MgZnCa Micro/nano-structure array[C]//Sixth International Conference on Optical and Photonic Engineering (ICOPEN 2018).Xi’an:International Society for Optics and Photonics,2018,10827:1082737.
[7] GUO S,LIU R,NIU C,et al.Tin Nanoparticles–Enhanced Optical Transportation in Branched CdS Nanowire Waveguides[J].Advanced Optical Materials,2018,6(17):1800305.
[8] HUANG B R,YANG Y K,YANG W L.Key Technique for Texturing a Uniform Pyramid Structure with a Layer of Silicon Nitride on Monocrystalline Silicon Wafer[J].Applied Surface Science,2013,266(2):245.
[9] SIVASUBRAMANIAM S,ALKAISI M M.Inverted Nanopyramid Texturing for Silicon Solar Cells Using Interference Lithography[J].Microelectronic Engineering,2014,119:146.
[10] AMALATHAS A P,ALKAISI M M.Periodic Upright Nanopyramid Fabricated by Ultraviolet Curable Nanoimprint Lithography for Thin Film Solar Cells[J].International Journal of Nanotechnology,2017,14(1/6):3.
[11] PAIVANRANTA B,SAASTAMOINEN T,KUITTINEN M.A Wide-angle Antireflection Surface for the Visible Spectrum[J].Nanotechnology,2009,20(37):7.
[12] CHEN H L,CHUANG S Y,LIN C H,et al.Using Colloidal Lithography to Fabricate and Optimize Sub-wavelength Pyramidal and Honeycomb Structures in Solar Cells[J].Optics Express,2007,15(22):14793.
[13] PARK S,LEE S K.Micro-optical Pattern-based Selective Transmission Mechanism[J].Applied Optics,2016,55(9):2457.
[14] CHEN Y L,CAI Y,SHIMIZU Y,et al.Ductile Cutting of Silicon Microstructures with Surface Inclination Measurement and Compensation by Using a Force Sensor Integrated Single Point Diamond Tool[J].Journal of Micromechanics and Microengineering,2015,26(2):025002.
[15] JIANG W,LIU H Z,YIN L,et al.Enhanced Photoelectric Properties in Dye-Sensitized Solar Cells Using TiO2 Pyramid Arrays[J].Journal of Physical Chmistry C,2016,120(18):9678.
[16] AMALATHAS A P,ALKAISI M M.Efficient Light Trapping Nanopyramid Structures for Solar Cells Patterned Using UV Nanoimprint Lithography[J].Materials Science in Semiconductor Processing,2017,57:54.
[17] GE S B,LIU W G,ZHOU S,et al.Design and Preparation of a Micro-Pyramid Structured Thin Film for Broadband Infrared Antireflection[J].Coatings,2018,8(5):192.
[18] 周顺.电阻阵列红外景物产生器微桥结构的材料及制作研究[D].西安:西安电子科技大学,2011.ZHOU Shun.Research on Material and Fabrication of Microbridge Resistor Arrays for Infrared Scene Projectors[D].Xi’an:Xidian University,2011.(in Chinese)
[19] WU H,ODOM T W,CHIU D T,et al.Fabrication of Complex Three-dimensional Microchannel Systems in PDMS[J].Journal of the American Chemical Society,2003,125(2):554.
[20] VILLANUEVA L G,VAZQUEZ M O,OLMOS M C,et al.Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography[J].Micromachines,2013,4(4):370.
[21] NAGATO K.Injection Compression Molding of Replica Molds for Nanoimprint Lithography[J].Polymers,2014,6(3):604.