摘要
为了减小柔性平台中的阿贝(Abbe)误差和最小化余弦误差。文章介绍了一种通过增材制造(AM)工艺以及立体光刻技术制造,基于聚合物的大范围XY纳米定位器的交叉耦合效应,设计了一种能够在±1.0mm范围运动的XY平台。对于XY和YX轴,AM平台的交叉耦合率分别为3.4%和8.1%,比有限元法估算值1.0%要大得多,这也是造成AM制造公差或材料特性局部不规则的原因。因此AM平台应该定位为反馈控制,以避免交叉耦合效应。实验结果表明,在半径1.0mm和1Hz圆周运动条件下,均方根径向轨迹误差为3.62mm。因此,AM平台可用于大范围纳米精密应用。
In order to reduce the Abbe error and minimize the cosine error in the flexible platform. This paper introduces a cross-coupling effect of polymer-based large-scale XY nano-positioners fabricated by additive manufacturing(AM) process and stereolithography, and designs a XY stage capable of moving in the range of±1.0 mm. For the XY and YX axes, the cross-coupling ratios of the AM platform are 3.4% and 8.1%, respectively, which is much larger than the finite element method estimate of 1.0%, which is also responsible for the AM manufacturing tolerances or local irregularities in material properties. Therefore the AM platform should be positioned as a feedback control to avoid cross-coupling effects. The experimental results show that the root mean square radial trajectory error is 3.62 mm under the circular motion conditions of 1.0 mm and 1 Hz. Therefore, the AM platform can be used for a wide range of nano precision applications.
引文
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