摘要
本文以全球范围内的专利申请数据为分析样本,对三价铬的相关专利进行分析,总结该领域的专利申请现状和研究进展。并对三价铬电镀液体系,如氯化物体系、硫酸盐体系的优缺点进行评述,并对电镀中存在问题探讨了解决途径。
The article analyzes the patent about trivalent chromium plating, from the patent application over the world,in order to learn the chromium development in the field and patent application status. The advantages and disadvantages of different electroplating saluting,such as chloride system or sulfate system, were discussed as well. Some problems that should be deeply studied and feasible methods were pointed out.
引文
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[2]杨哲龙,屠振密,张景双,等.三价铬电镀的新进展[J].电镀与环保,2001,21(2):1-4.
[3]吴慧敏.三价铬电镀的工艺研究[J].表面技术,2007,36(1):62-64.