三价铬电镀专利分析

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英文篇名：Analysis of the Patent about Trivalent Chromium Plating 作者：钮挺 ; 赵韦韦 英文作者：Niu Ting;Zhao Weiwei;Patent Examination Cooperation Tianjin Center of The Patent Office.CNIPA, Chemistry Examination Department; 关键词：铬电镀 ; 氯化物体系 ; 硫酸盐体系 ; 专利 英文关键词：chromium plating;;chloride system;;sulfate system;;patents 中文刊名：GDHG 英文刊名：Guangdong Chemical Industry 机构：国家知识产权局专利局专利审查协作天津中心化学部; 出版日期：2019-02-15 出版单位：广东化工 年：2019 期：v.46;No.389 语种：中文; 页：GDHG201903051 页数：2 CN：03 ISSN：44-1238/TQ 分类号：122+130

摘要

本文以全球范围内的专利申请数据为分析样本,对三价铬的相关专利进行分析,总结该领域的专利申请现状和研究进展。并对三价铬电镀液体系,如氯化物体系、硫酸盐体系的优缺点进行评述,并对电镀中存在问题探讨了解决途径。
        The article analyzes the patent about trivalent chromium plating, from the patent application over the world,in order to learn the chromium development in the field and patent application status. The advantages and disadvantages of different electroplating saluting,such as chloride system or sulfate system, were discussed as well. Some problems that should be deeply studied and feasible methods were pointed out.

引文

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