摘要
通过磁控溅射方法制备Cu-Mg合金薄膜,随后进行去合金化得到纳米多孔铜膜。研究了Ar流量和溅射功率对合金膜表面质量和厚度的影响,分析了盐酸浓度对纳米孔形成的影响。利用结晶紫分子来表征纳米多孔铜的表面增强拉曼散射性能。结果表明,磁控溅射参数设置Ar流量为45 mL/min,且功率为70 W时,能够得到表面平整的Cu28Mg72合金薄膜。经1.00 M(mol/L)HCl腐蚀得到的多孔铜的孔最均匀,同时具有最好的拉曼信号增强效果。
Cu-Mg alloy films were prepared by magnetron sputtering method and then subjected to dealloying to obtain nano-porous copper films. The effects of Ar flow and sputtering power on the surface quality and thickness of alloy films were studied. The influence of hydrochloric acid concentration on the formation of nano-pores was analyzed. Crystal violet was used to characterize the surface-enhanced Raman scattering of nano-porous copper. The results show that Cu28 Mg72 alloy film with smooth surface can be obtained by the magnetron sputtering under Ar flow of 45 mL/min and power of 70 W. The most uniform pore of porous copper is obtained by 1.00 M(mol/L) HCl etching, and shows the best SERS effect.
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