总剂量效应对CMOS读出电路影响及设计加固方法研究
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  • 英文篇名:Study of total dose effects on CMOS readout integrated circuit and methods of hardened by design
  • 作者:李敬国 ; 温建国 ; 陈彦冠
  • 英文作者:LI Jing-guo;WEN Jian-guo;CHEN Yan-guan;North China Research Institute of Electro-Optics;
  • 关键词:总剂量效应 ; 读出电路 ; 环源结构 ; 环栅结构抗辐照
  • 英文关键词:total dose effect;;ROIC;;ringed-source geometry;;enclosed gate geometry;;radiation hardening
  • 中文刊名:JGHW
  • 英文刊名:Laser & Infrared
  • 机构:华北光电技术研究所;
  • 出版日期:2019-03-20
  • 出版单位:激光与红外
  • 年:2019
  • 期:v.49;No.486
  • 语种:中文;
  • 页:JGHW201903016
  • 页数:6
  • CN:03
  • ISSN:11-2436/TN
  • 分类号:101-106
摘要
总剂量效应会对CMOS读出电路的性能产生明显的影响,甚至使CMOS读出电路功能完全失效。本文主要分析了总剂量效应对NMOS器件阈值、漏电流和器件间漏电流的影响机理。随后,针对640×512 CMOS读出电路提出了可行的抗辐照版图设计方法。总剂量试验表明,采用环栅结构、环源结构的640×512读出电路芯片抗总剂量能力可以达到100 krad(Si)以上。
        Total dose effects can affect obviously ROIC′s performance and even make its function fail.Frist,the mechanism of total dose effect on the threshold,leakage current and inter-device leakage current of NMOS devices is analyzed.Then,the hardening radiation design methods for 640×512 ROIC chip is proposed.Total ionizing dose experiment shows that the ROIC's radiation tolerance,using enclosed gate geometry and ringed-source geometry,is beyond 100 krad(Si).
引文
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    [3] LI Jingguo.Infrared focal plane array signal readout and process technology[J].Laser & Infrared,2018,48(4):519-523.(in Chinese)李敬国.红外焦平面信号读出及处理技术[J].激光与红外,2018,48(4):519-523.
    [4] Lacoe,Ronald C.Improving integrated circuit performance through the application of hardness-by-design methodology[J].IEEE Trans.Nucl.Sci.,2008,55(4):1903-1925.
    [5] Nowlin N ,Bailey J,Turfler B,et al.A total dose hardening by design approach for high speed mixed signal CMOS integrated circuits[J].International Journal of High Speed Electronics and Systems,2014,14(2):367-378.
    [6] Gromov V,Annema A J,Kluit R,et al.A radiation hard bandgap reference circuit in a standard 0.13 μm CMOS technology[J].IEEE Trans.Nucl.Sci.,2008,54(6):2727-2733.

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