硫化退火温度对金属三靶顺序溅射CZTS薄膜性能的影响
详细信息    查看全文 | 推荐本文 |
  • 英文篇名:Effect of Annealing Temperature on Performance of CZTS Thin Films Prepared via Metal Targets Sequential Sputtering Followed by Sulfuration Technology
  • 作者:刘仪柯 ; 张坤 ; 唐雅琴 ; 蒋良兴 ; 刘芳洋 ; 赖延清
  • 英文作者:LIU Yi-ke;ZHANG Kun;TANG Ya-qin;JIANG Liang-xing;LIU Fang-yang;LAI Yan-qing;School of Material and Metallurgical Engineering,Guizhou Institute of Technology;School of Metallurgy and Environment,Central South University;Guizhou Key Laboratory of Light Metal Materials Preparation Technology;Gem Incorporated Company;
  • 关键词:硫化退火 ; 退火温度 ; 铜锌锡硫薄膜 ; 结晶性能
  • 英文关键词:sulfide annealing;;annealing temperature;;CZTS film;;crystallization property
  • 中文刊名:METE
  • 英文刊名:Nonferrous Metals(Extractive Metallurgy)
  • 机构:贵州理工学院材料与冶金工程学院;中南大学冶金与环境学院;贵州省轻金属材料制备技术重点实验室;格林美股份有限公司;
  • 出版日期:2018-01-10
  • 出版单位:有色金属(冶炼部分)
  • 年:2018
  • 基金:国家自然科学基金资助项目(51674298,51272292,51604088);; 贵州省科技合作计划项目(黔科合LH字[2015]7091);; 贵州省科技计划项目(黔科合LH字[2017]1064)
  • 语种:中文;
  • 页:METE201801016
  • 页数:4
  • CN:01
  • ISSN:11-1841/TF
  • 分类号:73-76
摘要
通过XRD及Raman物相分析、SEM形貌观察和EDS成分分析等方法研究了硫化退火温度对金属三靶顺序溅射铜锌锡硫(CZTS)薄膜性能的影响。结果表明,在一定温度范围内(500~580℃),随着温度的升高薄膜的结晶性能有变好的趋势,形貌也得到了改善。当温度达到600℃时,CZTS薄膜会发生分解反应,该分解反应不但导致薄膜结晶性能及形貌恶化,也造成了锡元素的损失。580℃条件下获得的薄膜各项性能俱佳,是最适合本实验体系的退火温度。
        The effects of temperature of sulfide annealing on properties of CZTS thin films based on sequential sputtering from three metal targets were systematically studied by XRD,Raman,SEM,and EDS.The results show that crystallization and morphology of film are enhanced with increase of annealing temperature from 500 ℃ to 580 ℃,but decomposition reaction of CZTS film occurs at 600 ℃,which not only deteriorates crystallization and morphology of film,but also cause losing of Sn element.The optimum sulfide annealing temperature is 580 ℃.
引文
[1]ZHOU H,HSU W C,DUAN H S,et al.CZTS nanocrystals:a promising approach for next generation thin film photovoltaics[J].Energy&Environmental Science,2013,6(10):2822-2838.
    [2]KATAGIRI H,JIMBO K.Fabrication of earth-abundant CZTS thin film solar cells[C]//Active-Matrix Flatpanel Displays and Devices(AMFPD),2016,The 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices.2016:54-55.
    [3]张坤,刘芳洋,赖延清,等.太阳电池用Cu2ZnSnS4薄膜的反应溅射原位生长及表征[J].物理学报,2011,60(2):796-802.
    [4]张坤,赵联波,陈志伟,等.Cu2ZnSnS4薄膜的制备及其表征[J].中南大学学报(自然科学版),2014,45(11):3740-3745.
    [5]杨佳,赵联波,张坤,等.双靶共溅射Cu-Sb合金预制层后硫化法制备CuSbS2光伏薄膜及其性能[J].中南大学学报(自然科学版),2015,46(9):3195-3202.
    [6]SCRAGG J J,ERICSON T,KUBART T,et al.Chemical insights into the instability of Cu2ZnSnS4 films during annealing[J].Chemistry of Materials,2011,23(20):4625-4633.
    [7]YU YOUNG MOON,SUNGUN NAM,BYUNGSUNG O,et al.Resonant Raman scattering in ZnS epilayers[J].Materials Chemistry and Physics,2003,78(1):149-153.
    [8]SU Z,SUN K,HAN Z,et al.Fabrication of Cu2ZnSnS4solar cells with 5.1%efficiency via thermal decomposition and reaction using a non-toxic sol-gel route[J].Journal of Materials Chemistry A,2014,2(2):500-509.
    [9]ZHANG K,SU Z,ZHAO L,et al.Improving the conversion efficiency of Cu2ZnSnS4 solar cell by low pressure sulfurization[J].Applied Physics Letters,2014,104(14):141101.
    [10]HAN J,JEON S,KIM W K.Selenization mechanisms of Sn and Zn investigated using in situ high-temperature X-ray diffraction[J].Thin Solid Films,2013,546:321-325.
    [11]ZILLNER E,PAUL A,JUTIMOOSIK J,et al.Lattice positions of Sn in Cu2ZnSnS4 nanoparticles and thin films studied by synchrotron X-ray absorption near edge structure analysis[J].Applied Physics Letters,2013,102(22):221908.
    [12]GUO Q,FORD G M,YANG W C,et al.Fabrication of7.2%efficient CZTSSe solar cells using CZTS nanocrystals[J].J Am Chem Soc,Dec,2010,132(49):17384-17386.
    [13]FAIRBROTHER A,GARCA-HEMME E,IZQUIERDOROCA V,et al.Development of a selective chemical etch to improve the conversion efficiency of Zn-rich Cu2ZnSnS4solar cells[J].J Am Chem Soc,2012,134(19):8018-8021.
    [14]KATAGIRI H,JIMBO K,MAW W S,et al.Development of CZTS-based thin film solar cells[J].Thin Solid Films,2009,517(7):2455-2460.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700