碳酰氟的研究进展
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摘要
碳酰氟是一种应用于半导体设备刻蚀和清洗的新型材料,在有机合成及氟化物的干燥、纯化领域也有重要应用。目前国内外关于碳酰氟的制备报道有很多,根据原料种类大体可分为四类,其中CO作为原料制备碳酰氟是应用最多的方法。作为应用于半导体行业的电子气体,对于纯度有一定的要求,因此碳酰氟的纯化也是制约其工业化应用的重要因素。
Carbonyl fluoride is a new type of material used in semiconductor devices for etching and cleaning. Carbonyl fluoride has many important applications,such as organic synthesis,the drying and purification of fluoride. At present,many reports are focused on the preparation of carbonyl fluoride. According to the types of raw materials,it can be divided into four categories,of which CO as raw material is the most widely used method to prepare carbonyl fluoride. When carbonyl fluoride is applied in the semiconductor industry as electronic gases,there are certain requirements for purification. Thus,the purification of carbonyl fluoride is the restrict factor for its industrial applications.
Carbonyl fluoride is a new type of material used in semiconductor devices for etching and cleaning. Carbonyl fluoride has many important applications,such as organic synthesis,the drying and purification of fluoride. At present,many reports are focused on the preparation of carbonyl fluoride. According to the types of raw materials,it can be divided into four categories,of which CO as raw material is the most widely used method to prepare carbonyl fluoride. When carbonyl fluoride is applied in the semiconductor industry as electronic gases,there are certain requirements for purification. Thus,the purification of carbonyl fluoride is the restrict factor for its industrial applications.
引文
[1]高島正之,米沢晋.フツ化カルボニルの製造方法:JP,11–116216[P].1999-06-12.
[2]三井有规.碳酰氟的制造方法及制造装置:中国,1890174[P].2007-01-03.
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[4]蒋玉贵,孟祥军,董云海,等.一种碳酰氟的制备方法:中国,103213965 A[P].2013-04-24.
[5]FAWCETT FRANK S,TULLOCK CHARLES W.Preparation of carbonal difluoride:US,3088975[P].1963-05-07.
[6]马克思·布劳恩,约翰内斯·艾歇尔.碳酰氟的制备:中国,1930081[P].2005-02-09.
[7]TAKUBO SEIJI,KUME TAKUJI,YAMAMOTO AKINORI,et al.Method for the preparation of carbonal difluoride:WO,2005105668[P].2005-03-08.
[8]全恒道,田村正则,关屋章.碳酰氟的制造方法:中国,101272983B[P].2006-09-26.
[9]大野博基,大井敏夫,横尾秀次郎.碳酰氟的制造方法:中国,200980139487.9[P].2009-10-02.
[10]蒋玉贵,冀延治,徐海云,等.一种碳酰氟的纯化方法:中国,103303894A[P].2013-06-17.
[11]于剑昆.Daikin准备选用COF2作为室内清洁气体[J].化学推进剂与高分子材料,2005,3(1):13.
[12]QUAN H,ZHANG N,ZHOU X,et al.Syntheses of isocyanates via amines and carbonyl fluoride[J].Journal of Fluorine Chemistry,2015(176):26-30.
[13]王汉利,张琳涵,王军.一种高收率的全氟甲基乙烯基醚(PMVE)的绿色合成方法:中国,201310744862.0[P].2013-12-30.
[14]岳立平,蒋玉贵,刘彤,等.一种四氟化硅的除水方法:中国,105347348A[P].2015-11-26.
[15]石津澄人,关尾章,福田健太郎,等.预处理金属氟化物及氟化物晶体的制造方法:中国,102026914A[P].2009-05-15.
[16]蒋玉贵,孟祥军,郭绪涛,等.新型干燥剂碳酰氟干燥性能研究[J].舰船科学技术,2014(10):132-136.
[2]三井有规.碳酰氟的制造方法及制造装置:中国,1890174[P].2007-01-03.
[3]毛利勇,田村哲也.ニフツ化カルボニルの製造方法:JP,2003–267712[P].2003-9-23.
[4]蒋玉贵,孟祥军,董云海,等.一种碳酰氟的制备方法:中国,103213965 A[P].2013-04-24.
[5]FAWCETT FRANK S,TULLOCK CHARLES W.Preparation of carbonal difluoride:US,3088975[P].1963-05-07.
[6]马克思·布劳恩,约翰内斯·艾歇尔.碳酰氟的制备:中国,1930081[P].2005-02-09.
[7]TAKUBO SEIJI,KUME TAKUJI,YAMAMOTO AKINORI,et al.Method for the preparation of carbonal difluoride:WO,2005105668[P].2005-03-08.
[8]全恒道,田村正则,关屋章.碳酰氟的制造方法:中国,101272983B[P].2006-09-26.
[9]大野博基,大井敏夫,横尾秀次郎.碳酰氟的制造方法:中国,200980139487.9[P].2009-10-02.
[10]蒋玉贵,冀延治,徐海云,等.一种碳酰氟的纯化方法:中国,103303894A[P].2013-06-17.
[11]于剑昆.Daikin准备选用COF2作为室内清洁气体[J].化学推进剂与高分子材料,2005,3(1):13.
[12]QUAN H,ZHANG N,ZHOU X,et al.Syntheses of isocyanates via amines and carbonyl fluoride[J].Journal of Fluorine Chemistry,2015(176):26-30.
[13]王汉利,张琳涵,王军.一种高收率的全氟甲基乙烯基醚(PMVE)的绿色合成方法:中国,201310744862.0[P].2013-12-30.
[14]岳立平,蒋玉贵,刘彤,等.一种四氟化硅的除水方法:中国,105347348A[P].2015-11-26.
[15]石津澄人,关尾章,福田健太郎,等.预处理金属氟化物及氟化物晶体的制造方法:中国,102026914A[P].2009-05-15.
[16]蒋玉贵,孟祥军,郭绪涛,等.新型干燥剂碳酰氟干燥性能研究[J].舰船科学技术,2014(10):132-136.