锗掺杂真空蒸镀基板距离对多晶硅薄膜的影响
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摘要
在真空蒸镀多晶硅薄膜中掺入杂质可改善膜的微结构及电特性,目前有关基板距离对所得膜层的影响研究不多。采用真空蒸镀掺杂锗的方法制备出多晶硅薄膜;通过扫描电镜、X射线衍射仪、拉曼光谱仪等研究了基板距离对掺锗多晶硅薄膜的组织、形貌、晶粒尺寸及晶化率的影响。结果表明:随着基板距离的增大,薄膜的晶粒尺寸和晶化率均呈现出先增大后减小的相似趋势;当基板距离为90 mm时,晶粒尺寸显著增大,最大达到0.8μm左右,多晶硅薄膜晶粒形貌、结构性能最好,且具有较高的结晶度,薄膜的晶化率最高可达到85.10%。
Germanium-doped polycrystalline silicon film was prepared by vacuum evaporation plating.The effect of substrate distance of vacuum evaporation plating on the microstructure,morphology,grain size,and crystallization ratio of Ge-doped polycrystalline Si film was investigated with a scanning electron microscope,an X-ray diffractometer,and a Raman spectrometer.Results indicated that the grain size and crystallization ratio of the Ge- doped polycrystalline Si film tended to rise initially but declined later with increasing substrate distance.Particularly,the polycrystalline Si film prepared at a substrate distance of 90 mm exhibited considerably increased grain size(the maximum grain size was as much as 0.8 μm);and the film had optimized grain morphology,microstructure and properties,while its crystallization ratio was as much as 85.10%.
Germanium-doped polycrystalline silicon film was prepared by vacuum evaporation plating.The effect of substrate distance of vacuum evaporation plating on the microstructure,morphology,grain size,and crystallization ratio of Ge-doped polycrystalline Si film was investigated with a scanning electron microscope,an X-ray diffractometer,and a Raman spectrometer.Results indicated that the grain size and crystallization ratio of the Ge- doped polycrystalline Si film tended to rise initially but declined later with increasing substrate distance.Particularly,the polycrystalline Si film prepared at a substrate distance of 90 mm exhibited considerably increased grain size(the maximum grain size was as much as 0.8 μm);and the film had optimized grain morphology,microstructure and properties,while its crystallization ratio was as much as 85.10%.
引文
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[6]唐正霞,沈鸿烈,鲁林峰,等.氧化铝膜对铝诱导制备多晶硅薄膜的影响[J].真空科学与技术学报,2010,30(1):38~42.
[7]徐树深,梅丽文,张建光,等.镀膜装置蒸发源发射形态与膜厚分布[J].真空,2010,47(6):23~25.
[2]陈海力.制备工艺对铝诱导多晶硅薄膜性能影响的研究[D].南京:南京航空航天大学,2011.
[3]陈永生,郜小勇,杨仕娥,等.掺磷硅薄膜的微结构及电特性研究[J].压电与声光,2006,28(6):733~735.
[4]Sadoh T,Nagatomo K,Tsunoda I,et al.Enhanced crystal nucleation inα-Si on SiO2 by local Ge doping[J].Thin Solid Films,2004(464/465):99~102.
[5]王宙,何旭,付传起,等.真空蒸镀锗掺杂多晶硅薄膜的研究[J].真空科学与技术学报,2013(11):54~57.
[6]唐正霞,沈鸿烈,鲁林峰,等.氧化铝膜对铝诱导制备多晶硅薄膜的影响[J].真空科学与技术学报,2010,30(1):38~42.
[7]徐树深,梅丽文,张建光,等.镀膜装置蒸发源发射形态与膜厚分布[J].真空,2010,47(6):23~25.