氯硅烷残液水解制备二氧化硅团聚的机理研究
详细信息    查看全文 | 推荐本文 |
  • 英文篇名:Mechanism Analysis of Silica Dioxide Agglomeration in the Process of Chlorosilane Residue Hydrolysis
  • 作者:黄兵 ; 董森林 ; 陈樑 ; 杨杰 ; 赵义 ; 徐卜刚 ; 蔡吉祥
  • 英文作者:HUANG Bing;DONG Sen-lin;CHEN Liang;YANG Jie;ZHAO Yi;XU Bu-gang;CAI Ji-xiang;Faculty of Environmental Science and Engineering,Kunming University of Science and Technology;
  • 关键词:氯硅烷残液 ; 二氧化硅 ; 位阻剂 ; 团聚 ; 机理
  • 英文关键词:chlorosilane residue;;silica dioxide;;surface active agent;;agglomeration;;mechanism
  • 中文刊名:RGJT
  • 英文刊名:Journal of Synthetic Crystals
  • 机构:昆明理工大学环境科学与工程学院;
  • 出版日期:2017-05-15
  • 出版单位:人工晶体学报
  • 年:2017
  • 期:v.46;No.223
  • 基金:国家自然科学基金(41261079)
  • 语种:中文;
  • 页:RGJT201705022
  • 页数:6
  • CN:05
  • ISSN:11-2637/O7
  • 分类号:127-132
摘要
多晶硅生成工艺中的副产物氯硅烷残液,具有腐蚀性强、产量大等特点。采用多晶硅副产物氯硅烷残液为原料进行水解反应生成二氧化硅。研究了以不同水解方式在不同水解体系中引入位阻剂及该位阻剂的时效性对二氧化硅团聚的影响以及机理研究。结果表明:气-液反应的水解方式产出的二氧化硅呈现颗粒状具有颗粒特性;水解体系中引入位阻剂后产物二氧化硅分散性好,颗粒均匀、粒径大小在2μm左右;并且证实了位阻剂的位阻作用具有时效性。
        Chlorosilane residue is the by-product in the process of polysilicon production,which is highly productive and high corrosive. In the paper,chlorosilane residue was used as raw material to product silica dioxide via hydrolysis. Additionally,the mechanism of silica dioxide agglomeration and the effects of different methods of hydrolysis and surface active agent on the process of chlorosilane residue hydrolysis were investigated. The results show that the silicon dioxide is generated via gas-liquid reaction of hydrolysis and the product show granular particle characteristics,after adding the surface active agent,the silica dioxide presented good dispersion,in a uniform particle size of 2 μm,moreover,the steric effect of surface active agents has timeliness.
引文
[1]刘小锋,王岭.多晶硅化学制备方法的比较分析[J].新材料产业,2011(6):65-69.
    [2]刘秀琼,唐正林.多晶硅生产技术项目化教程[M].北京:化学工业出版社,2013,1-10.
    [3]杨涛.改良西门子法生产多晶硅工艺设计探讨[J].贵州化工,2009,34(3):7-11.
    [4]周迎春.多晶硅生产中氯硅烷残液的资源化处理与利用[J].中国化工贸易,2015,26(7).
    [5]路向平.氯硅烷残液干燥回收技术探讨[J].化工管理,2014(17):129-130.
    [6]刘挥彬,杨永亮,张升学,等.氯硅烷残液处理技术研究进展[J].有色冶金节能,2016,32(5):231-238.
    [7]Kohler B,Schulz E,Vendt B.Separation of Metal Chlorides from Their Suspensions in Chlorosilanes[P]:US Patent:6602428,2003-10-05.
    [8]Vyhmeister E,Reyes-Bozo L,Rodríguez-Maecker R,et al.Study of Low-k Film Functionalization and Pore Sealing Using Chlorosilanes Dissolved in Supercritical Carbon Dioxide[J].Chemical Engineering Communications,2016,203(7):1-17.
    [9]SzabóG,Nyulászi L.Substituent Effect on the Hydrolysis of Chlorosilanes:Quantum Chemical and QSPR Study[J].Structural Chemistry,2016:1-11.
    [10]Larsen R T,Toepke M W.Purification of Chlorosilanes Using Chromatography[J].Journal of Liquid Chromatography&Related Technologies,2016,10(7):235-253.
    [11]Breneman W C,Reeser D M.Disposal process for Contaminated Chlorosilanes Process[P].US patent:4743344,1988-05-10.
    [12]Adam J,Roscher C,Eger C,et al.Silicon dioxide dispersion:EP,US9376544[P].US patent:9376544,2016-06-28.
    [13]Morters M,Mangold H,Oswald M,et al.Pyrogenic Silicon Dioxide and a Dispersion Thereof:EP[P].US 20080045411 A1,2008-04-15.
    [14]Kuehner U D.Surface modified silicon dioxide particles[P].US,US9388314,2016,14(2):143-156.
    [15]Zhao Y,Slepkov A D,Akoto C O,et al.Synthesis,Structure,and Nonlinear Optical Properties of Cross-conjugated Perphenylated Isopolydiacetylenes[J].Chemistry-A European Journal,2004,11(1):321-329.
    [16]柳冠青.范德华力和静电力下的细颗粒离散动力学研究[D].北京:清华大学,2011.
    [17]杨劲.多晶硅生产中氯硅烷残液的资源化处理与利用[D].天津:天津大学,2013.
    [18]齐占波.走出分子动理论与内能的误区[J].数理化解题研究:初中版,2016(5):59-59.
    [19]Xu Z.Mechano-Chemical Preparation and Application of Mulberry-Like Ca Co/Si OComposite Particles in Superhydrophobic Films[J].Soft Materials,2011,10(4):435-448.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700