电感耦合大气等离子体加工熔石英的研究
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摘要
采用电感耦合原理,在大气压条件下激发气体产生等离子体,通过等离子体中的活性粒子与材料表面原子发生化学反应,生成易挥发的气体,实现熔石英的稳定去除。大气等离子体抛光熔石英的去除函数为高斯型,在一定参数下,去除函数的形状与等离子体炬到工件表面的靶距有关,靶距越近,等离子体中的活性粒子数越多,材料去除率越高,反应在加工轨迹上就是去除深度越大,半峰全值越大。
The theory of induction coupling was used in atmospheric pressure toexcitated reactive gas achieve plasma gas. The chemical reaction was produced by the activeparticle in plasma with the atoms in material surface to create gaseousstuff, and then quartz is removed. The removal function of induction coupling of atmosphere plasma from Guass function. In any determinated parameters, the shape of the removal function have relationship with the distance between spout and workpiece. If the spout and workpiece are more closer, the number of reactive atoms are larger in the plasma. The machiningtrack are more deeper and the full width at half maximun are more larger.
The theory of induction coupling was used in atmospheric pressure toexcitated reactive gas achieve plasma gas. The chemical reaction was produced by the activeparticle in plasma with the atoms in material surface to create gaseousstuff, and then quartz is removed. The removal function of induction coupling of atmosphere plasma from Guass function. In any determinated parameters, the shape of the removal function have relationship with the distance between spout and workpiece. If the spout and workpiece are more closer, the number of reactive atoms are larger in the plasma. The machiningtrack are more deeper and the full width at half maximun are more larger.
引文
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[3]王东方.大气等离子体加工熔石英材料过程的若干影响因素研究[D].哈尔滨:哈尔滨工业大学,2011
[4]张巨帆,王波,董申.大气等离子体抛光技术在超光滑硅表面加工中的应用[J].光学精密工程,2007,15(11):1749-1755
[5]管井秀郎.等离子体电子工程学[M].北京:科学出版社,2002
[6]王家富.大气等离子体抛光系统设计及实验研究[D].哈尔滨:哈尔滨工业大学,2008
[7]Jeffrey W.Carr,Livermore,CA(US).Apparatus and Method for Atmospheric Pressure Reactive Atom Plasma Processing for Shaping of Damage Free Surfaces[P].United States.Foreign Patent Documents,US7510664B2.Mar.31,2009
[8]William Jo hn O'Brien.Characterisation and Material Removal PropertiesoftheRAPTMProcess[D].UK:CranfieldUniversity,2011
[9]Hideo Takino,Kazuya Yamamura,Yasuhisa Sano,and Yuzo Mori.Removal characteristics of plasma chemicalvaporization machining with a pipeelectrode for optical fabrication[J].APPLIED OPTICS.2010,49,(23):4434-4440
[10]刘虎生,邵宏翔.电感耦合等离子体质谱技术与应用[M].北京:化学工业出版社,2005