激光沉积大面积均匀薄膜数学模型与实验
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摘要
由于激光烧蚀靶材产生的等离子体呈高斯分布,其中所包含粒子密度及性能的空间分布极不均匀,因此脉冲激光沉积法难以制备性能与膜厚均匀的大面积薄膜。提出并构建了衬底自转与一维变速平移机构,衬底匀速自转的同时,进行一维平移,越靠近等离子体中心平移速率越大、反之越小,达到均匀镀膜的目的;在此基础上建立了机构运动参数对膜厚影响的数学模型,通过仿真模拟分析关键参数对膜厚分布的影响;通过运动参数优化指导实验,最终获得了直径为200mm、不均匀性不超过±4%的大面积类金刚石膜,与仿真优化结果吻合。
Because plasma generated through laser ablation takes on a Gaussian form,dimensional distribution of quantity and kinetic energy of particles are terribly uneven,it's difficult to prepare large area films with uniform thickness and performance by pulse laser deposition.In our study,a translation device was designed,the shifting velocity of the rotational substrate increased gradually while approaching the center of plasma,whereas decreased gradually while departing in order to obtain a uniform film.The math model of influence of motion parameters on thickness of the film was founded.Finally,through simulation and optimization,the uniform diamond-like carbon film with diameter of 200 mm and thickness variation below ±4% was prepared by pulse laser deposition.
Because plasma generated through laser ablation takes on a Gaussian form,dimensional distribution of quantity and kinetic energy of particles are terribly uneven,it's difficult to prepare large area films with uniform thickness and performance by pulse laser deposition.In our study,a translation device was designed,the shifting velocity of the rotational substrate increased gradually while approaching the center of plasma,whereas decreased gradually while departing in order to obtain a uniform film.The math model of influence of motion parameters on thickness of the film was founded.Finally,through simulation and optimization,the uniform diamond-like carbon film with diameter of 200 mm and thickness variation below ±4% was prepared by pulse laser deposition.
引文
[1]Cheng Yong,Wang Shuyun,Lu Yimin,et al.Research of diamond-like carbon film deposited by double pulsed lasers[C]//The 6th Forum on New Materials-Part C,Switzerland:Trans Tech Publications,2014:11-16.
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[3]王淑云,陆益敏,刘旭,等.碳化硼薄膜的激光法制备及性能[J].强激光与粒子束,2013,25(4):895-897.(Wang Shuyun,Lu Yimin,Liu Xu,et al.Preparation and properties of boron carbide film using pulsed laser deposition.High Power Laser and Particle Beams,2013,25(4):895-897)
[4]张玲,何智兵,李俊,等.溅射功率对碳化硼薄膜组分与力学性能的影响[J].强激光与粒子束,2013,25(9):2318-2324.(Zhang Ling,He Zhibing,Li Jun,et al.Influence of sputtering power on components and mechanical properties of boron carbide films.High Power Laser and Particle Beams,2013,25(9):2318-2324)
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[8]Pryds N,Schou J,Linderoth S.The spatial thickness distribution of metal films produced by large area pulsed laser deposition[J].Applied Surface Science,2007,253(12):8231-8234.
[9]Kreutz E W,Backes G,Mertin M.Large area pulsed laser deposition of ceramic films[J].Surface and Coatings Technology,1997,97(3):435-441.
[10]Pryds N,Toftmann B,Bilde-Srensen J B,et al.Thickness determination of large-area films of yttria-stabilized zirconia produced by pulsed laser deposition[J].Applied Surface Science,2006,252(11):4882-4885.
[11]Wang Sheng,Ye Jingfeng,Liu Jingru,et al.Optimal simulation for the thickness uniformity of the film deposited by pulse laser sputtering[J].Acta Photonica Sinica,2010,39(8):1543-1546.
[12]张磊,王秀凤,林晓东.脉冲激光沉积类金刚石薄膜的厚度均匀性建模[J].西南科技大学学报,2007,22(4):14-19.(Zhang Lei,Wang Xiufeng,Lin Xiaodong.The thickness uniformity modeling for DLC films obtained by PLD.Journal of Southwest University of Science and Technology,2007,22(4):14-19)
[13]Dietsch R,Holz T,Mai H,et al.Large-area pulsed laser deposition(PLD)[J].Mat Res Soc Symp Proc,1995,382(1):83-88.
[2]王淑云,郭延龙,刘旭,等.飞秒激光制备硅窗口增透保护类金刚石膜[J].强激光与粒子束,2010,22(8):1706-1709.(Wang Shuyun,Guo Yanlong,Liu Xu,et al.Preparation of anti-reflective and protective diamond-like carbon film on Si substrate by femto-second pulsed laser deposition.High Power Laser and Particle Beams,2010,22(8):1706-1709)
[3]王淑云,陆益敏,刘旭,等.碳化硼薄膜的激光法制备及性能[J].强激光与粒子束,2013,25(4):895-897.(Wang Shuyun,Lu Yimin,Liu Xu,et al.Preparation and properties of boron carbide film using pulsed laser deposition.High Power Laser and Particle Beams,2013,25(4):895-897)
[4]张玲,何智兵,李俊,等.溅射功率对碳化硼薄膜组分与力学性能的影响[J].强激光与粒子束,2013,25(9):2318-2324.(Zhang Ling,He Zhibing,Li Jun,et al.Influence of sputtering power on components and mechanical properties of boron carbide films.High Power Laser and Particle Beams,2013,25(9):2318-2324)
[5]Guido D,Cultrera L,Perrone A.The pulsed laser ablation deposition technique:a new deposition configuration for the synthesis of uniform films[J].Surface and Coatings Technology,2004,180(5):603-606.
[6]Robert Eason.Pulsed laser deposition of thin films:applications-led growth of functional materials[M].Massachusetts:John Wiley&Sons,Inc,2007:32-33.
[7]Lackner J M,Waldhauser W,Ebner R.Large-area high-rate pulsed laser deposition of smooth TiCxN1-xcoatings at room temperature—mechanical and tribological properties[J].Surface and Coatings Technology,2004,188(3):519-524.
[8]Pryds N,Schou J,Linderoth S.The spatial thickness distribution of metal films produced by large area pulsed laser deposition[J].Applied Surface Science,2007,253(12):8231-8234.
[9]Kreutz E W,Backes G,Mertin M.Large area pulsed laser deposition of ceramic films[J].Surface and Coatings Technology,1997,97(3):435-441.
[10]Pryds N,Toftmann B,Bilde-Srensen J B,et al.Thickness determination of large-area films of yttria-stabilized zirconia produced by pulsed laser deposition[J].Applied Surface Science,2006,252(11):4882-4885.
[11]Wang Sheng,Ye Jingfeng,Liu Jingru,et al.Optimal simulation for the thickness uniformity of the film deposited by pulse laser sputtering[J].Acta Photonica Sinica,2010,39(8):1543-1546.
[12]张磊,王秀凤,林晓东.脉冲激光沉积类金刚石薄膜的厚度均匀性建模[J].西南科技大学学报,2007,22(4):14-19.(Zhang Lei,Wang Xiufeng,Lin Xiaodong.The thickness uniformity modeling for DLC films obtained by PLD.Journal of Southwest University of Science and Technology,2007,22(4):14-19)
[13]Dietsch R,Holz T,Mai H,et al.Large-area pulsed laser deposition(PLD)[J].Mat Res Soc Symp Proc,1995,382(1):83-88.