超精密光栅尺位移测量系统
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摘要
针对光刻机运动台位移测量需求,研究了利用二次衍射光干涉的对称式光栅尺位移测量系统。基于多普勒效应分析了光栅尺的位移测量原理,推导了光栅尺位移测量模型。设计了基于商用双频激光干涉仪的测量对比实验平台,开展了光栅尺位移测量系统原理验证实验、测量一致性实验和测量稳定性实验。实验结果分别表明:光栅尺位移测量系统原理正确;光栅尺和激光干涉仪位移测量系统间测量结果的差值小于16.67nm的置信度为0.95,具有良好测量一致性;光栅尺位移测量系统具有较好的抗干扰能力,鲁棒性强,能够满足光刻机运动台位移测量需求。
To meet the needs of the motion stage displacement measurement of the lithography machine,a kind of symmetrical grating displacement measurement system using the second-order diffracted light interference was researched.Based on the Doppler Effect,the displacement measurement principle of the grating was analyzed and the grating displacement measurement model was deduced. A measurement contrast experiment platform based on commercial dualfrequency laser interferometer was designed,and the principle verification experiment,measurement consistency experiment and measurement stability experiment of grating displacement measurement system were carried out. The experimental results show that the encoder displacement measuring system principle is correct. The confidence degree is 0. 95 when the deviation of two measurement systems is less than 16. 67 nm. The grating displacement measurement system has good environmental robustness and can meet the needs of the displacement measurement of the motion stage of the lithography machine.
To meet the needs of the motion stage displacement measurement of the lithography machine,a kind of symmetrical grating displacement measurement system using the second-order diffracted light interference was researched.Based on the Doppler Effect,the displacement measurement principle of the grating was analyzed and the grating displacement measurement model was deduced. A measurement contrast experiment platform based on commercial dualfrequency laser interferometer was designed,and the principle verification experiment,measurement consistency experiment and measurement stability experiment of grating displacement measurement system were carried out. The experimental results show that the encoder displacement measuring system principle is correct. The confidence degree is 0. 95 when the deviation of two measurement systems is less than 16. 67 nm. The grating displacement measurement system has good environmental robustness and can meet the needs of the displacement measurement of the motion stage of the lithography machine.
引文
[1]佚名.国家集成电路产业发展推进纲要[J].中国集成电路,2014,23(7):14-16.
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[3]池峰,朱煜,张志平,高为宫.双频激光干涉测量中的环境补偿技术[J].中国激光,2014,41(04):190-196.
[4]王磊杰,张鸣,朱煜,鲁森,杨开明.超精密外差利特罗式光栅干涉仪位移测量系统[J].光学精密工程,2017,25(12):2975-2985.
[5]KONKOLA P T.Design and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions[D].Cambridge:Massachusetts Institute of Technology,2003.
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[8]楚兴春,吕海宝,杜列波.莫尔(干涉)条纹计数细分和辨向技术的研究[J].光学技术,2004,30(4):475-477.
[9]LEE C B,KIM G H,LEE S K.Design and construction of a single unit multi-function optical encoder for a six-degree-of-freedom motion error measurement in an ultraprecision linear stage[J].Measurement Science&Technology,2012,22(10):105901.
[10]苏绍璟,刘辉,吕海宝,等.纳米级位移分辨率双光栅系统的多普勒分析[J].光学精密工程,2003,11(1):17-21.
[11]KIMURA A,GAO W,KIM W J,et al.A sub-nanometric three-axis surface encoder with short-period planar gratings for stage motion measurement[J].Precision Engineering,2012,36(4):576-585.
[12]曹卫锋,张梅,文方,谢泽会.高速高精度光栅位移传感器辨向与细分算法的设计[J].组合机床与自动化加工技术,2010,46(9):27-29+33.
[13]吴萍,张志平.一种光栅测量系统[P].中国专利:CN106931877A,2017-07-07.
[2]郑亚忠.基于平面光栅尺的光刻机工件台位置测量技术研究[C]//.中国光学学会光学测试专业委员会.第十六届全国光学测试学术交流会摘要集,中国光学学会光学测试专业委员会,2016:1.
[3]池峰,朱煜,张志平,高为宫.双频激光干涉测量中的环境补偿技术[J].中国激光,2014,41(04):190-196.
[4]王磊杰,张鸣,朱煜,鲁森,杨开明.超精密外差利特罗式光栅干涉仪位移测量系统[J].光学精密工程,2017,25(12):2975-2985.
[5]KONKOLA P T.Design and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions[D].Cambridge:Massachusetts Institute of Technology,2003.
[6]CASTENMILLER T,MAST F V D,KORT T D,et al.Towards ultimate optical lithography with NXT:1950i dual stage immersion platform[J].Proceedings of Spie the International Society for Optical Engineering,2010,7640(3):511-519.
[7]LI X,GAO W,MUTO H,et al.A six-degree-of-freedom surface encoder for precision positioning of a planar motion stage[J].Precision Engineering,2013,37(3):771-781.
[8]楚兴春,吕海宝,杜列波.莫尔(干涉)条纹计数细分和辨向技术的研究[J].光学技术,2004,30(4):475-477.
[9]LEE C B,KIM G H,LEE S K.Design and construction of a single unit multi-function optical encoder for a six-degree-of-freedom motion error measurement in an ultraprecision linear stage[J].Measurement Science&Technology,2012,22(10):105901.
[10]苏绍璟,刘辉,吕海宝,等.纳米级位移分辨率双光栅系统的多普勒分析[J].光学精密工程,2003,11(1):17-21.
[11]KIMURA A,GAO W,KIM W J,et al.A sub-nanometric three-axis surface encoder with short-period planar gratings for stage motion measurement[J].Precision Engineering,2012,36(4):576-585.
[12]曹卫锋,张梅,文方,谢泽会.高速高精度光栅位移传感器辨向与细分算法的设计[J].组合机床与自动化加工技术,2010,46(9):27-29+33.
[13]吴萍,张志平.一种光栅测量系统[P].中国专利:CN106931877A,2017-07-07.